11 nm hard X-ray focus from a large-aperture multilayer Laue lens

• DOI: 10.1038/srep03562
• Publication Date: 2013-12-20T10:10:13Z
• Authors: Xiaojing Huang; Hanfei Yan; Evgeny Nazaretski; Raymond Conley; Nathalie Bouet; Juan Zhou; Kenneth Lauer; Li Li; Daejin Eom; Daniel Legnini; Ross Harder; Ian K. Robinson; Yong S. Chu
• Keywords: Ptychography; Aperture (computer memory); Numerical aperture

The focusing performance of a multilayer Laue lens (MLL) with 43.4 μm aperture, 4 nm finest zone width and 4.2 mm focal length at 12 keV was characterized X-rays using ptychography method. reconstructed probe shows full-width-at-half-maximum (FWHM) peak size 11.2 nm. obtained X-ray wavefront excellent agreement the dynamical calculations, exhibiting aberrations less than 0.3 wave period, which ensures MLL capable producing diffraction-limited focus while offering sufficient working distance. This achievement opens up opportunities incorporating variety in-situ experiments into ultra high-resolution microscopy studies.