A selective etching phenomenon on {001} faceted anatase titanium dioxide single crystal surfaces by hydrofluoric acid

• DOI: 10.1039/c0cc04848h
• Publication Date: 2011-01-14T15:57:57Z
• Authors: Yun Wang; Haimin Zhang; Yanhe Han; Porun Liu; Xiangdong Yao; Huijun Zhao
• Keywords: Engineering; Chemical sciences; 02 engineering and technology; 0210 nano-technology; 530; 510

A selective etching phenomenon on {001} faceted anatase TiO(2) single crystal surfaces by HF and associated etching mechanism are reported. Density functional theory (DFT) calculations reveal that HF stabilizes the grown {001} facets at low concentrations, but selectively destroys the grown {001} facets at high concentrations.