Improvement of the gas cluster ion beam-(GCIB)-based molecular secondary ion mass spectroscopy (SIMS) depth profile with O2+ cosputtering

• DOI: 10.1039/c5an02677f
• Publication Date: 2016-03-08T11:31:12Z
• Authors: Yi-Hsuan Chu; Hua-Yang Liao; Kang-Yi Lin; Hsun-Yun Chang; Wei-Lun Kao; Ding-Yuan Kuo; Yun-Wen You; Kuo-Jui Chu; Chen-Yi Wu; Jing-Jong Shyue
• Keywords: 02 engineering and technology; 0210 nano-technology

The Ar₂₅₀₀⁺ and O₂⁺ cosputter in ToF-SIMS depth profiles retained >95% molecular ion intensity the steady-state.