Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents

• DOI: 10.1039/c5cc05272f
• Publication Date: 2015-09-07T14:31:41Z
• Authors: A. Delabie; M. Caymax; B. Groven; M. Heyne; K. Haesevoets; J. Meersschaut; T. Nuytten; H. Bender; T. Conard; P. Verdonck; S. Van Elshocht; S. De Gendt; M. Heyns; K. Barla; I. Radu; A. Thean
• Keywords: Deposition; Nanocrystalline material; Reducing agent

We demonstrate the impact of reducing agents for Chemical Vapor Deposition (CVD) and Atomic Layer (ALD) WS2 from WF6 H2S precursors. Nanocrystalline layers with a two-dimensional structure can be obtained at low deposition temperatures (300-450 °C) without using template or anneal.