Scaling down contact length in complementary carbon nanotube field-effect transistors

• DOI: 10.1039/c7nr03223d
• Publication Date: 2017-06-09T02:53:36Z
• Authors: Lijun Liu; Chenguang Qiu; Donglai Zhong; Jia Si; Zhiyong Zhang; Lian-Mao Peng
• Keywords: Contact resistance

This paper presents a systematic exploration on source/drain contact length scaling in carbon nanotube complementary FETs based transfer method.