Atmospheric pressure chemical vapor deposition of methylammonium bismuth iodide thin films

• DOI: 10.1039/c7ta06578g
• Publication Date: 2017-10-31T11:33:24Z
• Authors: Xiao Chen; Yoon Myung; Arashdeep Thind; Zhengning Gao; Bo Yin; Meikun Shen; Sung Beom Cho; Peifu Cheng; Bryce Sadtler; Rohan Mishra; Parag Banerjee
• Keywords: 02 engineering and technology; 0210 nano-technology

High quality methylammonium bismuth iodide films made using atmospheric pressure chemical vapor deposition.