Effect of processing conditions on additive DISC patterning of P3HT films

• DOI: 10.1039/c8tc04519d
• Publication Date: 2018-12-04T21:34:12Z
• Authors: Jun Li; Daniella M. Holm; Shravya Guda; Zaira I. Bedolla-...; Goktug Gonel; Ian E. Jacobs; Makena A. Dettmann; Jan Saska; Mark Mascal; Adam J. Moulé
• Keywords: Micrometer

There is a critical need to develop method pattern semiconducting polymers for device applications on the sub-micrometer scale.