MD simulation study on defect evolution and doping efficiency of p-type doping of 3C-SiC by Al ion implantation with subsequent annealing
Physical sciences
0103 physical sciences
01 natural sciences
DOI:
10.1039/d0tc05374k
Publication Date:
2021-01-11T03:57:58Z
AUTHORS (9)
ABSTRACT
For the first time, doping efficiency and defect evolution of p-type by aluminum in SiC are clarified distinguished an MD study.
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