Unraveling the adhesion characteristics of ruthenium as an advanced metal interconnect material using machine learning potential

• DOI: 10.1039/d4tc04870a
• Publication Date: 2025-03-17T10:17:41Z
• Authors: Eunseog Cho; Won-Joon Son; Seungmin Lee; Hyeon-Seok Do; Kyoungmin Min; Dae Sin Kim

This study combines machine learning potential and steered molecular dynamics to provide atomic-level understanding of the adhesion properties of Ru/SiO2 interfaces.