Low temperature deposition of patterned TiO2 thin films using photopatterned self-assembled monolayers

• DOI: 10.1063/1.117916
• Publication Date: 2002-07-26T13:43:06Z
• Authors: Rochael J. Collins; Hyunjung Shin; Mark R. DeGuire; Arthur H. Heuer; Chaim N. Sukenik
• Keywords: Microelectronics; Deposition; Self-assembled monolayer; Nanocrystalline material

Patterned thin films of TiO2 were deposited from aqueous solution onto photopatterned self-assembled monolayer (SAM) on Si substrates. Regions the SAM containing sulfonate surface functionality created by photo-oxidation initially thioacetate groups through a mask. The nanocrystalline TiO2-on-SAM selectively photolyzed regions SAM. electrical properties such assessed for potential microelectronic device applications. Current–voltage and capacitance–voltage measurements made nonpatterned yielded values relative permittivity ranging 24 to 57, film resistivities 1.0–1.5×109 Ω cm breakdown voltages in excess 1 MV/cm.