Fabrication of photonic crystals by deep x-ray lithography

• DOI: 10.1063/1.120431
• Publication Date: 2002-07-26T13:29:38Z
• Authors: G. Feiertag; W. Ehrfeld; H. Freimuth; H. Kolle; H. Lehr; M. Schmidt; M. M. Sigalas; C. M. Soukoulis; G. Kiriakidis; T. Pedersen; J. Kuhl; W. Koenig
• Keywords: Photoresist

We have developed a new microfabrication technique for the construction of three-dimensional photonic crystals. In particular, we used multiple tilted x-ray lithography exposures in order to construct structures with band gaps infrared region. First polymethylmethacrylate (PMMA) resist layers thickness 500 μm were irradiated, then holes structure filled preceramic polymer and subsequent pyrolysis converts into SiCN ceramic. Theoretical results fitted values dielectric constant are good agreement transmission measurements.