Fabrication of 10 nm enclosed nanofluidic channels

• DOI: 10.1063/1.1489102
• Publication Date: 2002-07-28T22:05:02Z
• Authors: Han Cao; Zhaoning Yu; Jian Wang; Jonas O. Tegenfeldt; Robert H. Austin; Erli Chen; Wei Wu; Stephen Y. Chou
• Keywords: Nanoimprint lithography; Nanoelectromechanical systems; Nanofluidics; Nanometre; Deposition

We made uniform arrays of nanometer scale structures using nanoimprint lithography over large areas (100 mm wafers). The nanofluidic channels were further narrowed and sealed by techniques that are based on nonuniform deposition. resulting have a cross section as small 10 nm 50 nm, great importance for confining biological molecules into ultrasmall spaces. These can be valuable fabrication tools Nanoelectromechanical Systems Micro/Nano Total Analysis Systems.