Fabrication of efficient microaxicon by direct electron-beam lithography for long nondiffracting distance of Bessel beams for optical manipulation

• DOI: 10.1063/1.1953876
• Publication Date: 2005-07-05T22:00:38Z
• Authors: W. C. Cheong; B. P. S. Ahluwalia; X.-C. Yuan; L.-S. Zhang; H. Wang; H. B. Niu; X. Peng
• Keywords: Bessel beam; Realization (probability)

We demonstrate a fabrication technique in the realization of microaxicon by single-step processing via electron-beam lithography. Microaxicon is used for generation propagation-invariant Bessel beams which find tremendous applications optical trapping. The proposed simple, reliable, and reproducible method production high-quality with long distances, our configuration, excess 20cm. Such nondiffracting distances are essential tweezers systems many cases.