Focusing of hard x-rays to 16 nanometers with a multilayer Laue lens

• DOI: 10.1063/1.2912503
• Publication Date: 2008-06-07T23:52:31Z
• Authors: Hyon Chol Kang; Hanfei Yan; Robert P. Winarski; Martin V. Holt; Jörg Maser; Chian Liu; Ray Conley; Stefan Vogt; Albert T. Macrander; G. Brian Stephenson
• Keywords: 02 engineering and technology; 0210 nano-technology

We report improved results for hard x-ray focusing using a multilayer Laue lens MLL. We have measured a line focus of 16 nm width with an efficiency of 31% at a wavelength =0.064 nm 19.5 keV using a partial MLL structure with an outermost zone width of 5 nm. The results are in good agreement with the theoretically predicted performance. © 2008 American Institute of