Stress and magnetoelastic properties control of amorphous Fe80B20 thin films during sputtering deposition

• DOI: 10.1063/1.2931043
• Publication Date: 2008-06-03T22:32:00Z
• Authors: I. Fernández-Mart...; J. L. Costa-Krämer; F. Briones
• Keywords: Coalescence (physics); Deposition

In situ stress measurements during sputtering deposition of amorphous Fe80B20 films are used to control their and magnetoelastic properties. The substrate curvature induced by the deposited film is measured optically growth quantitatively related accumulated stress. resulting magnetic properties later correlated with for a wide range pressures [(2−25)×10−3 mbar]. A significant tensile develops at film-substrate interface early stages (initial 2–3 nm). At critical thickness, transition observed from compressive stress, which associated island coalescence. By further increasing follows, local distortion ion peening effect. Monte Carlo simulations process describe experimental results as function Ar pressure target bias voltage.