Fast growth of graphene patterns by laser direct writing

• DOI: 10.1063/1.3569720
• Publication Date: 2011-03-24T18:14:38Z
• Authors: J. B. Park; W. Xiong; Y. Gao; M. Qian; Z. Q. Xie; M. Mitchell; Y. S. Zhou; G. H. Han; L. Jiang; Y. F. Lu
• Keywords: Computer Engineering; 02 engineering and technology; Electrical and Computer Engineering; 0210 nano-technology; 530

Rapid single-step fabrication of graphene patterns was developed using laser-induced chemical vapor deposition (LCVD). A laser beam irradiates a thin nickel foil in CH4 and H2 environment to induce local temperature rise, thereby allowing the direct writing precisely controlled positions at room temperature. Line can be achieved with single scan without pre- or postprocesses. Surprisingly, growth rate is several thousand times faster than that general CVD methods. The discovery development LCVD process provide route for rapid various applications.