Strong second-harmonic generation in silicon nitride films

• DOI: 10.1063/1.4704159
• Publication Date: 2012-04-17T22:55:02Z
• Authors: Tingyin Ning; Henna Pietarinen; Outi Hyvärinen; Janne Simonen; Goëry Genty; Martti Kauranen
• Keywords: Crystal (programming language); Nanophotonics

We observe strong second-harmonic generation from silicon nitride films prepared on fused silica substrates by plasma enhanced chemical vapor deposition. The components of the second-order nonlinear optical susceptibility tensor are calibrated against quartz crystal. dominant component has magnitude 2.5 pm/V, almost two orders larger than reported for Si3N4, and about three times traditional crystal potassium dihydrogen phosphate. results indicate that great potential devices, especially in on-chip nanophotonics.