Vacuum arc plasma generation and thin film deposition from a TiB2cathode

• DOI: 10.1063/1.4935152
• Publication Date: 2015-11-04T18:01:11Z
• Authors: Igor Zhirkov; Andrejs Petruhins; Lars-Ake Naslund; Szilard Kolozsvári; Peter Polcik; Johanna Rosen
• Keywords: Physical Sciences; Fysik; 02 engineering and technology; 0210 nano-technology; 7. Clean energy

We have studied the utilization of TiB2 cathodes for thin film deposition in a DC vacuum arc system. We present a route for attaining a stable, reproducible, and fully ionized plasma flux of Ti and B by removal of the external magnetic field, which leads to dissipation of the vacuum arc discharge and an increased active surface area of the cathode. Applying a magnetic field resulted in instability and cracking, consistent with the previous reports. Plasma analysis shows average energies of 115 and 26 eV, average ion charge states of 2.1 and 1.1 for Ti and B, respectively, and a plasma ion composition of approximately 50% Ti and 50% B. This is consistent with measured resulting film composition from X-ray photoelectron spectroscopy, suggesting a negligible contribution of neutrals and macroparticles to the film growth. Also, despite the observations of macroparticle generation, the film surface is very smooth. These results are of importance for the utilization of cathodic arc as a method for synthesis of ...