Dependence of trapping and segregation of indium in silicon on the velocity of the liquid-solid interface
Supercooling
Recrystallization (geology)
DOI:
10.1063/1.91856
Publication Date:
2003-02-13T20:58:23Z
AUTHORS (6)
ABSTRACT
The segregation phenomena of In-implanted Si have been observed following the melting and epitaxial regrowth surface layers by pulsed ruby laser irradiation. velocity liquid-solid interface on recrystallization has varied from 1.8 to 5.2 m/s in two independent ways. Indium is be trapped substitutional sites, excess solid solubilities, or segregated a thin layer. Trapping increases decreases as interfacial raised. complete depth profiles can fitted with unique coefficients which are dependent. material that shows cell structure approximately 100 Å diameter arising lateral due constitutional supercooling. cells not present at velocities 5 m/s. critical dependence In trapping range 2–5 interpreted terms residence times.
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