Reproducible technique for fabrication of thin films of high transition temperature superconductors

• DOI: 10.1063/1.98513
• Publication Date: 2002-07-26T13:03:23Z
• Authors: P. M. Mankiewich; J. H. Scofield; W. J. Skocpol; R. E. Howard; A. H. Dayem; E. Good
• Keywords: Photoresist; Resistive touchscreen; Transition temperature

We report on a new process to make films of Y1Ba2Cu3O7 using coevaporation Y, Cu, and BaF2 SrTiO3 substrates. The have high transition temperatures (up 91 K for full resistive transition), critical current densities (106 A/cm2 at 81 K), reduced sensitivity fabrication environmental conditions. Because the lower reactivity films, we been able pattern them in both pre-annealed post-annealed states conventional positive photoresist technology.