Fabrication of Mesoporous Cobalt Oxide (Co<SUB>3</SUB>O<SUB>4</SUB>) Film by Electrochemical Method for Electrochemical Capacitor

• DOI: 10.1166/jnn.2010.2318
• Publication Date: 2010-04-01T19:20:55Z
• Authors: Jin-Kyu Lee; Gil-Pyo Kim; Kyung-Hwa Kim; In Kyu Song; Sung-Hyeon Baeck
• Keywords: Cobalt oxide

Mesoporous cobalt oxide (Co3O4) films were deposited on ITO coated glass substrates by electrodeposition from an aqueous CoSO4 solution using CTAB (cetyltrimethylammonium bromide) as the templating agent. The structures of synthesized characterized X-ray diffraction, and photoelectron spectroscopy. presence mesoporosity was confirmed transmission electron microscopy small angle diffraction analyses. mesoporous found to be strongly dependent deposition conditions, such voltage, time, temperature concentration Cyclic voltammetry discharging curves used examine electrochemical properties a capacitor. prepared with showed much higher specific capacitance current density than nonporous electrode without templating.