Growth of Carbon Nanowalls on Metal-Coated Substrates via Microwave Plasma Enhanced Chemical Vapor Deposition

• DOI: 10.1166/jnn.2014.10106
• Publication Date: 2014-09-24T21:20:30Z
• Authors: Sangjoon Lee; Won Seok Choi
• Keywords: 0301 basic medicine; 03 medical and health sciences

In this study, we investigated the growth properties of carbon nanowalls (CNW) depending on the substrate types. We deposited metal films on Si substrates via RF magnetron sputtering with the use of four-inch W, Cu and Ni targets. A microwave plasma enhanced chemical vapor deposition (PECVD) system was used to grow CNWs on the metal-coated Si substrates using H2 and CH4 gases. The vertical and superficial conditions of the grown CNWs depending on the substrate types were characterized by field emission scanning electron microscopy (FE-SEM). Raman analysis was used to investigate the structural properties of the CNWs. Based on this experiment, it was found that the direct growth of CNW was possible on the metal layer with a thickness of more than 50 nm.