Effect of Annealing Temperature on the Structural and Optical Properties of ZnO Thin Film Annealed with Novel Annealing Method

• DOI: 10.1166/sam.2021.3985
• Publication Date: 2021-10-25T04:35:01Z
• Authors: Sihun Lee; Dongwan Kim; Jae-Young Leem
• Keywords: Ultraviolet; Spin Coating

Zinc oxide (ZnO) thin films were deposited on silicon substrates by a sol-gel spin-coating method. The annealed using novel annealing method named thermal dissipation (TDA) method, at temperatures varying from 400 °C to 600 °C. It was found that ZnO the TDA forms nanosheet structures surface of films. formation nanosheets could be attributed particle migration mechanism based temperature gradient, which heavily influenced temperature. Higher near-band-edge (NBE) emission intensities observed for TDA-annealed I compared as-grown film. intensity dependent Enhanced photoresponse properties exhibited suggesting can used improve performance in applications such as ultraviolet photodetection.