Characterization of Thin Copper Diffusion Barrier Layer in Beryllium Capsules

• DOI: 10.13182/fst13-tfm20-16
• Publication Date: 2015-05-28T17:38:46Z
• Authors: H. Xu; K. P. Youngblood; H. Huang; J. J. Wu; K. A. Moreno; A. Nikroo; S. J. Shin; Y. M. Wang; A. V. Hamza
• Keywords: Auger electron spectroscopy

The point design of beryllium capsules includes three Cu-doped layers in a 160-μm-thick shell to achieve the desired X-ray absorption profile. were deposited on glow discharge polymer mandrels using magnetron sputtering process. Cu diffusion during pyrolysis remove after coating has caused nonuniform distribution along azimuthal direction due inhomogeneous diffusion. This nonuniformity could lead Rayleigh-Taylor instability capsule implosion. One methods solve this issue is incorporate oxide barrier layer at beryllium-Cu-doped-beryllium interfaces. In situ and ex have proved be effective stopping paper will focus approaches we developed characterize thickness by combination Auger electron spectroscopy profiles Rutherford backscattering spectrometry measurements.