III-As Pillar Arrays by Metal-Assisted Chemical Etching for Photonic Applications

• DOI: 10.1364/cleo_si.2013.cth1j.3
• Publication Date: 2013-06-26T11:19:17Z
• Authors: Parsian K. Mohseni; Lei Pan; Xiang Zhao; Seung Hyun Kim; Karthik Balasundaram; Jeong Dong Kim; James J. Coleman; Xiuling Li
• Keywords: 02 engineering and technology; 0210 nano-technology

Ordered arrays of GaAs/InGaAs micro and nanopillars are formed by metal-assisted chemical etching (MacEtch). The dependence of morphology and etch rate upon temperature, etchant composition, and doping concentration are explored and optical characteristics are discussed.