Temperature dependent implantation of As-Isoelectronic Impurity in GaN Micro and Nanostructures
Wide-bandgap semiconductor
DOI:
10.1364/cleo_si.2024.sm2l.5
Publication Date:
2024-09-05T18:46:36Z
AUTHORS (8)
ABSTRACT
To enhance solar photo absorption of III-N semiconductors, we demonstrate Arsenic implantation at elevated temperatures, improving doping activation and reducing crystal damage.
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