Temperature dependent implantation of As-Isoelectronic Impurity in GaN Micro and Nanostructures

Wide-bandgap semiconductor
DOI: 10.1364/cleo_si.2024.sm2l.5 Publication Date: 2024-09-05T18:46:36Z
ABSTRACT
To enhance solar photo absorption of III-N semiconductors, we demonstrate Arsenic implantation at elevated temperatures, improving doping activation and reducing crystal damage.
SUPPLEMENTAL MATERIAL
Coming soon ....
REFERENCES (4)
CITATIONS (0)