Color filter based on a subwavelength patterned metal grating

Color filter array Extraordinary optical transmission
DOI: 10.1364/oe.15.015457 Publication Date: 2007-11-12T17:43:19Z
ABSTRACT
A color filter incorporating a subwavelength patterned grating in metal film perforated with square array of circular apertures on quartz substrate was accomplished. Its performance enhanced by applying dielectric overlay to the layer so as match refractive indices media either side it. The device designed utilizing finite-difference time-domain method and implemented adopting electron-beam direct-writing technique. Two different devices were fabricated structural parameters: height 50 nm pitch 340 for red 260 green color. For center wavelength 680 peak transmission 57%, while one 550 50%. It confirmed introduction index matching led an increase ~15% efficiency helped combine double bands into single dominant band well, thereby improving selectivity filter.
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