Absolute EUV reflectivity measurements using a broadband high-harmonic source and an in situ single exposure reference scheme

• DOI: 10.1364/oe.463216
• Publication Date: 2022-08-03T15:30:14Z
• Authors: Johann J. Abel; Felix Wiesner; Jan Nathanael; Julius Reinhard; Martin Wünsche; Gabriele Schmidl; Annett Gawlik; Uwe Hübner; Jonathan Plentz; Christian Rödel; Gerhard G. Paulus; Silvio Fuchs
• Keywords: FOS: Nanotechnology; Extreme ultraviolet lithography; Alumina; 0103 physical sciences; Nanotechnology; Reflection; Light sources; info:eu-repo/classification/ddc/530; 530; 01 natural sciences; X ray absorption; 0104 chemical sciences

We present a tabletop setup for extreme ultraviolet (EUV) reflection spectroscopy in the spectral range from 40 to 100 eV by using high-harmonic radiation. The simultaneous measurements of reference and sample spectra with high energy resolution provide precise and robust absolute reflectivity measurements, even when operating with spectrally fluctuating EUV sources. The stability and sensitivity of EUV reflectivity measurements are crucial factors for many applications in attosecond science, EUV spectroscopy, and nano-scale tomography. We show that the accuracy and stability of our in situ referencing scheme are almost one order of magnitude better in comparison to subsequent reference measurements. We demonstrate the performance of the setup by reflective near-edge x-ray absorption fine structure measurements of the aluminum L2/3 absorption edge in α-Al2O3 and compare the results to synchrotron measurements.