PURIFICATION AND HYDROGENATION OF METALLURGICAL SILICON POWDER BY RF THERMAL PLASMA. CHARACTERIZATION OF THE DEPOSIT.

• DOI: 10.1615/itppc-2002.870
• Publication Date: 2023-04-17T13:31:15Z
• Authors: M. Benmansour; M. Nickravech; E. Francke; Daniel Morvan; Jacques Amouroux; D. Ballutaud
• Keywords: Deposition

Plasma deposition process of metallurgical grade silicon powders was used in order to combine purification and processes onto different kinds substrate with a high rate (~ 100 µm.mn^−1). The particles are heated, melted, partially vaporised finally deposited on substrate. Under optimised experimental conditions dense deposits obtained ceramic thickness close 1 mm. Except the final crystallised zone, EDX ICP analysis show that have good purity. However, because fast crystallisation, several crystalline defects been observed. Introduction hydrogen passive this increase photovoltaic properties.