Preparation of Nickel Oxide Films by Sol-Gel Process

• DOI: 10.2109/jcersj.101.227
• Publication Date: 2011-07-13T11:37:41Z
• Authors: Lijiu WANG; Zhibo ZHANG; Yongmin CAO
• Keywords: Non-blocking I/O; Nickel oxide

The films have been prepared by the dip-coating technique using nickel nitrate hexahydrate, Ni(NO3)2⋅6H2O, as starting material and ethylene glycol solvent. In order to obtain uniform withdrawal speed should not exceed 12cm/min. crystalline phase formed after firing at 500°C for 2h is oxide, NiO, which belongs cubic system with lattice parameter a0=4.1769Å. conductivities of NiO are on 10-6S⋅cm-1 in our measurements.