Practical Applications of Argon Gas Cluster Ion Beam for X-ray Photoelectron Spectroscopy and Time-of-flight Secondary Ion Mass Spectrometry

• DOI: 10.3131/jvsj2.56.348
• Publication Date: 2013-09-28T02:03:35Z
• Authors: Takuya MIYAYAMA
• Keywords: Time-of-Flight

The recent applications of argon gas cluster ion beam (GCIB) for X-ray photoelectron spectroscopy (XPS) and time-of-flight secondary mass spectrometry (TOF-SIMS) are briefly reviewed. Depth profiling organic materials has been one the most notable challenges in conventional XPS TOF-SIMS. Recently, it is getting widely accepted that GCIB enabled us to obtain depth profiles materials. unique sputtering characteristics, such as extremely low chemical damage, high yield surface smoothing capability. These superior characteristics facilitate diverse TOF-SIMS, increasing analysis devices advanced polymers. In this review, discussed, focusing on film cleaning effect.