Vapor Deposition of Metallic Coatings by Very Low Pressure Plasma Spraying

• DOI: 10.31399/asm.cp.itsc2013p0001
• Publication Date: 2024-03-05T19:56:30Z
• Authors: B. Vautherin; M.-P. Planche; R. Bolot; G. Montavon; A. Quet; L. Bianchi
• Keywords: Deposition

Abstract Very low pressure plasma spraying (VLPPS) has been used to manufacture thin, dense, finely-structured ceramic coatings for various applications. This paper presents the results of work in which VLPPS is deposit metal. Aluminum was chosen as a demonstrative material, due its moderate vaporization enthalpy (38.23 KJ·cm-3), with objectives better understanding behavior solid precursor injected into jet, leading formation vapors, and controlling factors affecting coating structure. Nearly dense aluminum were successfully deposited by at 100 Pa an intermediate power (45 kW) torch. Optical emission spectroscopy (OES) observe metal powder simplified CFD modeling provided thermophysical mechanisms. The effect size distribution, substrate temperature, spray distance studied. Coatings characterized SEM observations Vickers microhardness measurements.