Experiment Research on Micro-/Nano Processing Technology of Graphite as Basic MEMS Material

• DOI: 10.3390/app9153103
• Publication Date: 2019-07-31T15:37:07Z
• Authors: Cheng Zhang; Yijin Liu; Mingge Wu; Ningbo Liao
• Keywords: Photoresist; Nanometre; Plasma Etching; Dry etching

Graphite is expected to be a common choice for basic microelectromechanical-system (MEMS) material in the future. However, order become MEMS material, it very important graphite adapted commonly-used micro-/nanoprocessing technology. Therefore, this paper used directly lithography and etching process study micro-, /nanoprocessing on graphite. The results show that surface suitable lithography, different shapes sizes of photoresist patterns can fabricated surface. In addition, micro-meter height could still resist plasma when nanometers structures. with were processed by etching, nanometer amounts etched. Moreover, micro-/nanoscale structure ranges from 29.4 nm–30.9 nm about 23° sidewall.