Preparation of an Integrated Polarization Navigation Sensor via a Nanoimprint Photolithography Process

• DOI: 10.3390/photonics9110806
• Publication Date: 2022-10-28T02:36:17Z
• Authors: Ze Liu; Jinkui Chu; Ran Zhang; Chuanlong Guan; Yuanyi Fan
• Keywords: Polarizer; Nanoimprint lithography; Microscale chemistry; Nanosensor; Nanophotonics

Based on the navigation strategy of insects utilizing polarized skylight, an integrated polarization sensor for autonomous is presented. The fabricated using proposed nanoimprint photolithography (NIPL) process by integrating a nanograting polarizer and image chip. NIPL uses UV-transparent variant template with nanoscale patterns microscale metal light-blocking layer. During process, part resist material pressed to fill into nanofeatures cured under UV exposure. At same time, other parts create micropatterns according Polymer-based templates can be used conformal contacts non-flat substrates excellent pattern transfer fidelity. suitable cross-scale micro–nano fabrication in wide applications. measurement error angle ±0.2°; thus, it will have good application prospect application.