Study of the Effect of Coating Thickness, Substrate Temperature and Biasing Voltage on Various Characteristics of AlN Film

• DOI: 10.4028/www.scientific.net/kem.442.211
• Publication Date: 2010-06-07T12:29:46Z
• Authors: F. Ali; A.M. Qasim; S. Imran; M. Mehmood; A. Jamil; M. Maqsood
• Keywords: Biasing; Deposition

AlN thin films have a wide range of applications in electronic devices. are used as protective coating thermo printing devices and also material cold cathodes. Moreover, these the most promising piezoelectric materials for surface acoustic wave (SAW) applications. In this work, were grown on glass MS substrates by reactive DC magnetron sputtering. The crystallographic micro-structural properties sputtered investigated using X-ray diffraction (XRD) scanning electron microscopy (SEM) respectively. found to be having hexagonal crystalline structure all cases irrespective deposition parameters. However, Al peaks observed showing simultaneous metallic layer deposition. Grain growth was with increase film thickness. Biasing resulted better adhesion nitride substrate. Hardness measurements made different parameters, but less significant changes observed.