Nondegradative Dielectric Coating on Graphene by Thermal Evaporation of SiO

• DOI: 10.7567/jjap.52.125102
• Publication Date: 2013-11-28T07:36:41Z
• Authors: Seiya Suzuki; Chien-Chung Lee; Takashi Nagamori; Thomas R. Schibli; Masamichi Yoshimura
• Keywords: Silicon oxide; Graphene foam

The deposition of dielectric materials onto graphene without introducing atomic defects is challenging owing to the unavoidable exposure carbon–carbon bonds plasma, energetic ions, or high-energy photons that are present during deposition. Here, we report a simple and nondegradative method depositing silicon oxide layer on based thermal evaporation monoxide (SiO). Raman spectroscopy mapping showed this does not form in graphene, whereas by e-beam severely damages graphene. SiO-coated also excellent resistance ozone hot air. Since SiO transparent visible light infrared light, coating may serve as protective for optical devices such photodetectors electro-optic modulators. Also noted much simpler than deposition, which requires additional functionalization