A5069360558- Silicon Nanostructures and Photoluminescence
- Advanced Surface Polishing Techniques
- Thin-Film Transistor Technologies
- ZnO doping and properties
- Silicon and Solar Cell Technologies
- Semiconductor materials and devices
Institute of Electrical Engineering
2020-2022
Chinese Academy of Sciences
2020-2022
University of Chinese Academy of Sciences
2020
We proposed a HF/HCl/H 2 O system with manganese dioxide (MnO ) particle as the oxidant to obtain high-performance texturization on multi-crystalline silicon (mc-Si) wafers. The obtained by O/MnO had more uniform distribution and lower surface reflectance than that conventional HF/HNO 3 /H system, especially of diamond wire sawn (DWS) mc-Si etching mechanism was revealed studying effects usage variation HF, HCl MnO . only occurs at locations where particles are deposited will self-terminate...