A5061987038- Advanced X-ray Imaging Techniques
- Advanced Measurement and Metrology Techniques
- Optical Coatings and Gratings
- Particle Accelerators and Free-Electron Lasers
- Advancements in Photolithography Techniques
- Optical measurement and interference techniques
- X-ray Spectroscopy and Fluorescence Analysis
- Advanced Surface Polishing Techniques
- Advanced Electron Microscopy Techniques and Applications
- Electron and X-Ray Spectroscopy Techniques
- Surface Roughness and Optical Measurements
- Optical Systems and Laser Technology
- Thin-Film Transistor Technologies
- Adaptive optics and wavefront sensing
- Particle accelerators and beam dynamics
- Surface and Thin Film Phenomena
- Diamond and Carbon-based Materials Research
- Parathyroid Disorders and Treatments
- Nuclear Physics and Applications
- Ruminant Nutrition and Digestive Physiology
- Advanced Sensor Technologies Research
- Advanced optical system design
- Selenium in Biological Systems
- Radiation Shielding Materials Analysis
- Advanced X-ray and CT Imaging
Synchrotron soleil
2010-2023
Centre National de la Propriété Forestière
2007
A soft x-ray spectrometer based on the use of an elliptical focusing mirror and a plane varied line spacing grating is described. It achieves both high resolution overall efficiency while remaining relatively compact. The instrument dedicated to resonant inelastic scattering studies. We set out how this optical arrangement was judged best able guarantee performance for 50 − 1000 eV range within achievable fabrication targets. AERHA (adjustable energy acceptance) operates with effective...
The laser–plasma accelerator (LPA) presently provides electron beams with a typical current of few kA, bunch length fs, energy in the hundred MeV to several GeV range, divergence typically 1 mrad, an spread order 1%, and normalized emittance π.mm.mrad. One first applications could be use these for production radiation: undulator emission has been observed but rather large (1%) (1 mrad) prevent straightforward free-electron laser (FEL) amplification. An adequate beam manipulation through...
Stitching interferometry is performed by collecting interferometric data from overlapped sub-apertures and stitching these together to provide a full surface map. The propagation of the systematic error in measured subset one main sources for accurate reconstruction topography. In this work, we propose, using redundancy captured data, two types two-dimensional (2D) self-calibration algorithms overcome issue situ estimating repeatable high-order additive errors, especially application...
We address the compositional evolution of structure ${\text{GaAs}}_{1\ensuremath{-}x}{\text{Bi}}_{x}$ thin films at different scale lengths by combining x-ray absorption spectroscopy, atomic force microscopy, and diffraction. find that Bi short range ordering, observed for $x<3\mathrm{%}$, drastically vanishes $x\ensuremath{\ge}5.4\mathrm{%}$. The recovery random anion distribution goes along with formation droplets sample surface while bulk maintains high crystalline quality. These...
Carbon contamination is a general problem of under-vacuum optics submitted to high fluence. In soft X-ray beamlines carbon deposit on known absorb and scatter radiation close the C K-edge (280 eV), forbidding effective measurements in this spectral region. Here observation strong reflectivity losses reported related deposition at much higher energies around 1000 eV, where absorptivity small. It shown that observed effect can be modelled as destructive interference from homogeneous thin film.
An alternate multilayer (AML) grating has been prepared by coating an ion etched lamellar with a B4C/Mo2C (ML) having layer thickness close to the groove depth. Such structure behaves as 2D synthetic crystal and can reach very high efficiencies when Bragg condition is satisfied. This AML coated characterized at SOLEIL Metrology Tests Beamline between 0.7 1.7 keV four-crystal monochromator beamline of Physikalisch-Technische Bundesanstalt (PTB) BESSY II 1.75 3.4 keV. A peak diffraction...
Boron carbide (B4C) is one of the few materials that expected to be mostly resilient with respect extremely high brilliance photon beam generated by free electron lasers (FELs) and thus considerable interest for optical applications in this field. However, as case many other optics operated at modern light source facilities, B4C-coated are subject ubiquitous carbon contaminations. These contaminations represent a serious issue operation performance FEL beamlines due severe reduction flux,...
We present an experimental study of the effect layer interfaces on x-ray reflectance in Cr/B4C multilayer interference coatings with thicknesses ranging from 0.7 nm to 5.4 nm. The multilayers were deposited by magnetron sputtering and ion beam sputtering. Grazing incidence reflectometry, soft transmission electron microscopy reveal asymmetric structures a larger B4C-on-Cr interface, which we modeled 1–1.5 thick interfacial layer. Reflectance measurements vicinity Cr L2,3 absorption edge...
SOLEIL Long Trace Profiler (LTP) is a custom made instrument developed in the former LURE. As many instruments of its kind, it based on pencil beam interferometry and uses principle stabilisation probe by pentaprism equivalent reflector. The interferometer however polarization located close to surface under test. optics head can be configured measure working position: face up, down or sideways. Particular care given absolute calibration because precise knowledge radii curvature required...
In the framework of European COoperation in field Scientific and Technical research action on "X-ray Neutron Optic" (COST P7) following decision announced last International Workshop Metrology for X-ray neutron optic (Grenoble, April 2004), metrology facilities four synchrotrons, Bessy, Elettra, ESRF Soleil, have decided started a program instrument inter-comparison. Other synchrotrons are joining us further interested Institutions invited to participate this open measurement comparison. The...
Generalization of specific optical metrology and systematic testing all delivered components has yield in the last decade to a significant improvement surfaces installed on synchrotron radiation (SR) beamlines around world. Surface roughness is classically characterized by phase-shift interferential microscope, sometimes AFM. Long trace profiler (LTP)<sup>1</sup>, which measures local slope along line profile, been choice instrument measure figure errors large size components. Present LTPs...
Before the first photon beam was delivered at SOLEIL synchrotron, scientists tried to anticipate problem of carbon contamination on optical components, with for instance outgasing chambers by prior exposure dummy optics. In spite these efforts, deterioration performance has remained an outstanding issue: low-energy beamlines SOLEIL. For example, results in significant photons flux losses (practically Carbon K edges), and modifications horizontal-to-vertical polarization transmission ratio,...
Stitching methods are increasingly used for determining the surface shape of large and high precision optical elements in synchrotron beamlines. They consist reconstructing topography from multiple measurements on overlapping parts optics aperture by various algorithms. This paper is an attempt to investigate how true accurate such a reconstruction can be. Error sources identified evaluated throughout acquisition processing steps. The analysis based example SOLEIL Michelson interferometer...
The upcoming generation of high accuracy synchrotron radiation (SR) optics will be characterized by a slope deviation from ideal shape in the range some 0.05μrad rms at sampling interval about 1mm. To certify and improve measurement capabilities metrology tools to inspect these stringent specifications, an essential step is worldwide intercomparison measurements based on set transfer standards. It aim cross verify “absolute” correctness comparability results obtained cooperating partners...
Diffraction gratings are key elements of soft X-ray synchrotron beamlines. Besides wavelength dispersion, specific parameters can be tailored to adjust the energy dependent efficiency and focusing, correct wavefront aberrations. As a beamline, any departure from design values severely reduce overall performance. On other hand, known non-conformities often corrected by slight adjustment alignment parameters. A careful accurate metrology is therefore required before installation on beamline....
The recent development of short-wavelength optics (X/EUV, synchrotrons) requires improved metrology techniques in terms accuracy and curvature dynamic range. In this article a stitching Shack-Hartmann head dedicated to be mounted on translation stages for the characterization X-ray mirrors is presented. principle instrument described experimental results an toroidal mirror are Submicroradian performances can achieved systematic comparison with classical long-trace profiler wide range...
Multilayer coated diffraction gratings are crucial components for extreme ultraviolet (EUV) applications such as spectroscopy or spectro-imaging. However, high groove density, the smoothening of grating surface profile with multilayer deposition remains a limitation that requires further investigation. In this paper, we report on design, characterization, and modeling 4000 lines/mm periodic aperiodic Al/Mo/SiC multilayers EUV radiation. Two types different depths compared. coatings were...
In this article, a stitching Shack-Hartmann profilometric head is presented. This instrument has been developed to answer improved needs for surface metrology in the domain of short-wavelength optics (X/EUV). It composed highaccuracy wavefront sensor and an illumination platform. mounted on translation stage perform bidimensional mappings by together successive sub-aperture acquisitions. method ensures submicroradian accuracy system allows user measure large surfaces with submillimetric...
Al/Mo/SiC periodic and aperiodic multilayers were optimized deposited on high groove density gratings to achieve broadband efficiency in the extreme ultraviolet (EUV). Grating efficiencies measured by monochromatic synchrotron radiation under 5° 45° incident angles wavelength ranges 17-25 nm 22-31 nm, respectively. We study influence of number periods initial trapezoidal profile EUV diffraction efficiency. propose models coatings based a combination characterizations compare rigorous...