A5083240643- Advancements in Photolithography Techniques
- Electron and X-Ray Spectroscopy Techniques
- Optical Coatings and Gratings
- Integrated Circuits and Semiconductor Failure Analysis
- Nanofabrication and Lithography Techniques
- Advanced optical system design
- Advanced X-ray Imaging Techniques
- Industrial Vision Systems and Defect Detection
- Advanced Surface Polishing Techniques
- Image Processing Techniques and Applications
- Welding Techniques and Residual Stresses
- Electromagnetic Simulation and Numerical Methods
- Photonic and Optical Devices
- Advanced Measurement and Metrology Techniques
- Surface Roughness and Optical Measurements
- Copper Interconnects and Reliability
- Magneto-Optical Properties and Applications
- Photorefractive and Nonlinear Optics
- Venous Thromboembolism Diagnosis and Management
- Silicon and Solar Cell Technologies
- Erythrocyte Function and Pathophysiology
- 3D IC and TSV technologies
- Advanced Fiber Laser Technologies
- Optical measurement and interference techniques
- Immune Cell Function and Interaction
Fraunhofer Institute for Integrated Systems and Device Technology
2015-2024
Schott (Germany)
2012-2024
Kantonsspital Baden
2012-2024
Schiller International University
2024
University of Lausanne
2023
IMEC
2023
Friedrich-Alexander-Universität Erlangen-Nürnberg
2012-2022
Humboldt-Universität zu Berlin
1991-2021
Walter de Gruyter (Germany)
2021
University of Applied Sciences Ravensburg-Weingarten
2021
Abstract Cell surface components of pathogens, such as lipopolysaccharide (LPS), are an important signal for receptor‐mediated activation immune cells. Here we demonstrate that DNA gram‐positive and gram‐negative bacteria or certain synthetic oligonucleotides displaying unmethylated CpG‐motifs can trigger macrophages in vitro to induce nuclear translocation factor‐ x B, accumulate tumor necrosis factor (TNF)‐α mRNA release large amounts TNF‐α. In vivo these events culminate acute...
PURPOSE The integration of immunotherapy in the perioperative setting muscle-invasive urothelial carcinoma (MIUC) appears promising. SAKK 06/17 investigated addition neoadjuvant durvalumab to gemcitabine/cisplatin (GC) chemotherapy followed by radical surgery and adjuvant checkpoint inhibition with durvalumab. PATIENTS AND METHODS was an investigator-initiated, open-label, single-arm phase II study including cisplatin-fit patients stage cT2-T4a cN0-1 operable MIUC. Four cycles GC combination...
Abstract Endotoxin (lipopolysaccharide; LPS) and superantigens (exotoxins) have been identified as potent inducers of lethal shock. While endotoxin primarily interacts with CD 14 receptors on macrophages, like the staphylococcal enterotoxin B (SEB) preferentially activate T cells. Both cell types are triggered to release pro‐inflammatory cytokines that in turn induce We analyzed whether superantigen interact during induction phase report LPS SEB operate synergistically. Lethal doses both...
Abstract The reflection and diffraction of extreme ultraviolet (EUV) light from lithographic masks the projection imaging these by all-reflective systems introduce several significant artifacts. off-axis illumination mask causes asymmetric shadowing, a size bias between features with different orientations telecentricity errors. image contrast varies feature orientation can easily drop far below intuitively expected values. deformation wavefront or phase incident thick absorbers generates...
Since its invention, the microscope has been optimized for interpretation by a human observer. With recent development of deep learning algorithms automated image analysis, there is now clear need to re-design microscope's hardware specific tasks. To increase speed and accuracy classification, this work presents method co-optimize how sample illuminated in microscope, along with pipeline automatically classify resulting image, using neural network. By adding "physical layer" classification...
Next-generation extreme ultraviolet (EUV) systems with numerical apertures of 0.55 have the potential to provide sub-8-nm half-pitch resolution. The increased importance stochastic effects at smaller feature sizes places further demands on scanner and mask high contrast images. We use rigorous diffraction imaging simulation understand impact EUV absorber identify most appropriate optical parameters for NA imaging. Simulations various cases material options indicate two main types solutions:...
This paper introduces Dr.LiTHO, a research and development oriented lithography simulation environment developed at Fraunhofer IISB to flexibly integrate our models into one coherent platform. We propose light-weight approach environment: The use of scripting (batch) language as an integration Out the great variety different languages, Python proved superior in many ways: It exhibits good-natured learning-curve, it is efficient, available on virtually any platform, provides sophisticated...
499 Background: Cisplatin-based neoadjuvant chemotherapy followed by surgery is the standard of care for patients (pts) with MIUC but relapse rates remain high. Immune checkpoint inhibitors have demonstrated efficacy in advanced urothelial carcinoma (UC). We hypothesize that integration PD-L1 inhibitor durvalumab into perioperative management improves outcome. Methods: SAKK 06/17 an open label single arm phase II study including 61 pts. Operable cT2-T4a cN0-1 pts without contraindication Cis...
Background: The successful introduction of extreme ultraviolet (EUV) lithography to high volume manufacturing has increased the interest push this technology its ultimate limits. This will require photoresist materials, which enable a better tradeoff between resolution, linewidth roughness and sensitivity, adaptation optical resolution enhancements that were originally developed for deep (DUV) lithography. Aim: We review published research on attenuated phase shift masks (attPSM) EUV with...
The application of resolution enhancement techniques pushes optical projection lithography close to its theoretical limit with a k1-factor 0.25. For the imaging this interaction between mask and shape illumination aperture gains increasing importance. By jointly optimizing source low k1 images can be printed process latitudes not achievable otherwise. This paper proposes new optimization procedure for geometries in lithography. A general merit function is introduced, that evaluates...
Rapamycin prevention of murine graft-versus-host disease (GVHD) is associated with a shift toward Th2- and Tc2-type cytokines. Recently, we found that use rapamycin during ex vivo donor Th2 cell generation enhances the ability adoptively transferred cells to prevent GVHD. In this study, using method, without antigen-presenting cells, T-cell expansion based on CD3,CD28 costimulation, evaluated whether (1) preferentially promotes Th2/Tc2 relative Th1/Tc1 (2) rapamycin-generated subsets induce...
Over the recent years EUV lithography has demonstrated patterning of ever shrinking feature sizes (enabling N7 technology node and below), while mask remained unaltered using a 70nm Ta-based absorber. This led to experimentally observed Mask 3D (M3D) effects at wafer level, which are induced by interaction between oblique incident light patterned absorber with typical thickness values in order several wavelengths. In this paper we exploit optical properties material as M3D mitigation...
Garnet films of the following compositions (Lu,Bi)/sub 3/(Fe,Ga,Al)/sub 5/O/sub 12/ and (Tm,Bi)/sub 3/(Fe,Ga)/sub are grown by liquid-phase epitaxy on [111]-oriented substrates gadolinium gallium garnet. Double layers with opposite signs Faraday rotation single prepared. Optical monomode rib waveguides realized using such films. The nonreciprocal phase shift fundamental TM-mode is studied both theoretically experimentally at a wavelength 1.3 /spl mu/m. maximum effect double layer about 1.7...
Ouabain-resistant K efflux and Rb influx in Cl NO3 media were studied volume-clamped low-K (LK) sheep red blood cells (SRBC) with normal experimentally reduced cytoplasmic Mg (Mgi) levels as function of pH at 37 degrees C. Sucrose was added to solutions constant ionic strength variable maintain cell volume. Cl-dependent ouabain-resistant K(Rb) fluxes (K-Cl cotransport) unity relative volume exhibited a maximum approximately 7 normal-Mgi LK consistent the apparent acid activation reported for...
A new and optimized waveguide based electromagnetic field solver for optical EUV mask simulations is presented. After an introduction of the method, convergence speed optimization adaptation method to lithography are Additionally a model simulation multilayer defects decomposition technique three dimensional enabling very fast computations as well large area Subsequently capabilities demonstrated exemplarily on state-of-the-art masks.
The mask plays a significant role as an active optical element in lithography, for both deep ultraviolet (DUV) and extreme (EUV) lithography. Mask-induced feature-dependent shifts of the best-focus position other aberration-like effects were reported DUV immersion EUV We employ rigorous computation light diffraction from lithographic masks combination with aerial image simulation to study root causes these their dependencies system parameters. Special emphasis is put on comparison...
Over the recent years, extreme ultraviolet (EUV) lithography has demonstrated patterning of ever-shrinking feature sizes (enabling N7 technology node and below), whereas EUV mask remained unaltered, using a 70-nm tantalum (Ta)-based absorber. This led to experimentally observed three-dimensional (M3D) effects at wafer level, which are induced by interaction between oblique incident light patterned absorber with typical thickness values on order several wavelengths. We exploit optical...
In next-generation EUV imaging for foundry N5 dimensions and beyond, inherent pitch- orientation-dependent effects on wafer level will consume a significant part of the lithography budget using current Ta-based mask. Mask absorber optimization can mitigate these so-called mask 3D effects. Thin metal absorbers like Ni Co have been experimentally investigated due to their high absorption, but they pose challenges technology subtractive patterning [1]. A simulation study attenuated phase shift...