Lin He

ORCID: 0000-0002-0617-1121
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About
Contact & Profiles
Research Areas
  • Advancements in Photolithography Techniques
  • Industrial Vision Systems and Defect Detection
  • Advanced Image and Video Retrieval Techniques
  • Electron and X-Ray Spectroscopy Techniques
  • Impact of Light on Environment and Health
  • Air Quality Monitoring and Forecasting
  • Sparse and Compressive Sensing Techniques
  • Numerical methods in inverse problems
  • Grey System Theory Applications
  • Atmospheric chemistry and aerosols
  • Optical Wireless Communication Technologies
  • Remote-Sensing Image Classification
  • Advanced Image Processing Techniques
  • Image Enhancement Techniques
  • Image and Signal Denoising Methods
  • Luminescence and Fluorescent Materials
  • Advanced Image Fusion Techniques
  • Evaluation and Optimization Models
  • Organic Light-Emitting Diodes Research
  • Organic Electronics and Photovoltaics
  • Medical Image Segmentation Techniques
  • Air Quality and Health Impacts
  • Welding Techniques and Residual Stresses
  • Solidification and crystal growth phenomena
  • VLSI and FPGA Design Techniques

Center For Remote Sensing (United States)
2024

Tongji University
2022-2024

Tianjin University of Technology and Education
2017-2022

State Key Laboratory of Information Engineering in Surveying Mapping and Remote Sensing
2020-2022

Union Hospital
2022

Huazhong University of Science and Technology
2008-2022

Jiangsu University of Science and Technology
2015-2021

Tongji Hospital
2012-2021

Tianjin University
2020-2021

Hefei University of Technology
2021

The Cahn–Hilliard equation is a nonlinear fourth order diffusion originating in material science for modeling phase separation and coarsening binary alloys. inpainting of images using the new approach image processing. In this paper we discuss stationary state proposed model introduce generalization grayvalue bounded variation. This realized by subgradients total variation functional within flow, which leads to structure with smooth curvature level sets.

10.1137/080728548 article EN SIAM Journal on Imaging Sciences 2009-01-01

Abstract In this paper we formulate a new time dependent model for blind deconvolution based on constrained variational that uses the sum of total variation norms signal and kernel as regularizing functional. We incorporate mass conservation nonnegativity additional constraints. apply idea Bregman iterative regularization, first used image restoration by Osher colleagues [S.J. Osher, M. Burger, D. Goldfarb, J.J. Xu, W. Yin, An iterated regularization method restoration, UCLA CAM Report,...

10.1002/ima.20040 article EN International Journal of Imaging Systems and Technology 2005-01-01

For semiconductor manufacturers moving toward advanced technology nodes -32nm, 22nm and below - lithography presents a great challenge, because it is fundamentally constrained by basic principles of optical physics. years, source optimization mask pattern correction have been conducted as two separate RET steps. optimization, the was optimized based on fixed patterns; in other words, OPC SRAFs were not considered during optimization. Recently, some new approaches to Source Mask Optimization...

10.1117/12.843578 article EN Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE 2009-12-03

As a distributed generation, grid-connected photovoltaic system affects the stability of power directly. The forecast precision for generation will be useful to planning and operation. According operation data, which characteristics are changed in exponent rule randomness, an advanced Grey-Markov chain model has been applied short-term 5.6 kW system. calculated result shows that GM(1,1) accuracy greatly enhanced. It indicates trend is more definite when was modified by Markov chain.

10.1109/iceet.2009.305 article EN International Conference on Energy and Environment Technology 2009-01-01

Abstract A trimeric quaternary ammonium salt surfactant containing polyoxyethylene chains was synthesized from fatty alcohol ether, pentamethyldiethylenetriamine and thionyl chloride by a two‐step process. Its chemical structure characterized, the surface activity in aqueous solution studied at different temperatures. The results showed that when concentration attains CMC (1.0 mmol/L), tension is 38.9 mN m −1 conductivity 105.3μS cm 25 °C. These show exhibits high effectively reduces of water.

10.1007/s11743-009-1166-y article EN Journal of Surfactants and Detergents 2009-11-16

Purpose: The purpose of study is to meet customer requirements and improve satisfaction that aims classify more effectively. And the classification focused on psychology. Design/methodology/approach: In this study, considering advantages Kano model in taking into account both customer’s consuming psychology motivation, combining with fuzzy theory which effective cope uncertainty ambiguity, a based proposed. view strong subjectivity traditional questionnaires, questionnaire service quality...

10.3926/jiem.1708 article EN cc-by Journal of Industrial Engineering and Management 2015-12-18

10.1007/s10851-006-8302-3 article EN Journal of Mathematical Imaging and Vision 2006-09-25

Abstract Magnetic resonance imaging (MRI) reconstruction from sparsely sampled data has been a difficult problem in medical field. We approach this by formulating cost functional that includes constraint term is imposed the raw measurement k‐space and L 1 norm of sparse representation reconstructed image. The usually realized total variational regularization and/or wavelet transform. have applied Bregman iteration to minimize recover finer scales our recent work. Here we propose nonlinear...

10.1002/pamm.200700776 article EN PAMM 2007-12-01

According to the ITRS roadmap, mask defects are among top technical challenges introduction of extreme ultraviolet (EUV) lithography into production. Making a multilayer defect-free blank is not possible today, and unlikely happen in next few years. This means that EUV must work with present on mask. The method proposed by Luminescent compensate effects images modifying absorber patterns. effect defect distort adjacent Although cannot be repaired, may restored their desired targets changing...

10.1117/12.879556 article EN Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE 2011-03-17

As optical lithography continues to extend into low-k1 regime, resolution of mask patterns under inspection conditions diminish. Furthermore, as complexity and MEEF has also increased, it requires detecting even smaller defects in the already narrower pitch patterns. This leaves engineer with option either purchase a higher tool or increase detector sensitivity on existing system maybe both. In order meet defect requirements critical features sub-32nm node designs, increasing typically...

10.1117/12.864284 article EN Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE 2010-09-28

In order to narrow the semantic gap, user interest model plays an important role in personalized image retrieval. A novel retrieval approach based on is proposed this study. User developed basis of short-tem and long-term interests. (1) Short-term interests are represented by collecting visual features. Visual features collected MARS relevance feedback. Semantic constructed building a mapping from low-level high-level SVM. (2) Long-term inferred inference engine short-term nonlinear gradual...

10.1142/s0218001410008019 article EN International Journal of Pattern Recognition and Artificial Intelligence 2010-05-01

Abstract Mask manufacturers will be impacted by two significant technology requirements at 22 nm and below: the first is more extensive use of resolution enhancement technologies (RET), such as aggressive optical proximity correction (OPC), inverse lithography (ILT), source mask optimization (SMO); second extreme ultraviolet (EUV) technology. Both create difficulties for inspection, defect disposition, metrology, review, repair. For example, ILT SMO significantly increases complexity, making...

10.1515/aot-2012-0127 article EN Advanced Optical Technologies 2012-09-01

10.1016/j.suscom.2020.100460 article EN Sustainable Computing Informatics and Systems 2020-10-11

For semiconductor manufacturers moving toward advanced technology nodes -32nm, 22nm and below - lithography presents a great challenge, because it is fundamentally constrained by basic principles of optical physics. Because no major hardware improvements are expected over the next couple years, Computational Lithography has been recognized industry as key needed to drive lithographic performance. This implies not only simultaneous co-optimization all enhancement tricks that have learned but...

10.1117/12.848145 article EN Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE 2010-03-08
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