- Topology Optimization in Engineering
- Advanced Multi-Objective Optimization Algorithms
- Composite Structure Analysis and Optimization
- Advanced Mathematical Modeling in Engineering
- Probabilistic and Robust Engineering Design
- Metaheuristic Optimization Algorithms Research
- Composite Material Mechanics
- Advanced Numerical Methods in Computational Mathematics
- Advanced Numerical Analysis Techniques
- Heat Transfer and Optimization
- Building Energy and Comfort Optimization
- Photonic and Optical Devices
- Structural Health Monitoring Techniques
- Piezoelectric Actuators and Control
- Manufacturing Process and Optimization
- Acoustic Wave Phenomena Research
- Vibration Control and Rheological Fluids
- Structural Analysis and Optimization
- Railway Engineering and Dynamics
- Vibration and Dynamic Analysis
- Photonic Crystals and Applications
- Stochastic Gradient Optimization Techniques
- Electromagnetic Scattering and Analysis
- Electromagnetic Simulation and Numerical Methods
- Simulation Techniques and Applications
Lawrence Livermore National Laboratory
2018-2024
Technical University of Denmark
2010-2022
University of Manchester
2018-2021
University of Twente
2018
NIL Technology (Denmark)
2015
Institute of Solid Mechanics
2007-2014
Technical University of Munich
2010-2011
Abstract The aim of this paper is to apply a Helmholtz‐type partial differential equation as an alternative standard density filtering in topology optimization problems. Previously, approach has been successfully applied sensitivity filter. usual techniques require information about the neighbor cells, which difficult obtain for fine meshes or complex domains and geometries. complexity problem increases further parallel computing, when design domain decomposed into multiple non‐overlapping...
SUMMARY The aim of this paper was to present a topology optimization methodology for obtaining robust designs insensitive small uncertainties in the geometry. variations are modeled using stochastic field. model can represent spatially varying geometry imperfections devices produced by etching techniques. Because under‐etching or over‐etching parts structure may become thinner thicker than reference design supplied manufacturer. assumed be and their influence on system response is evaluated...