Takeshi Mitani

ORCID: 0000-0002-4228-1707
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Research Areas
  • Silicon Carbide Semiconductor Technologies
  • Semiconductor materials and devices
  • Thin-Film Transistor Technologies
  • Silicon and Solar Cell Technologies
  • Copper Interconnects and Reliability
  • Diamond and Carbon-based Materials Research
  • Advanced ceramic materials synthesis
  • Semiconductor materials and interfaces
  • Silicon Nanostructures and Photoluminescence
  • Aluminum Alloys Composites Properties
  • Fullerene Chemistry and Applications
  • GaN-based semiconductor devices and materials
  • Advanced Surface Polishing Techniques
  • Integrated Circuits and Semiconductor Failure Analysis
  • ZnO doping and properties
  • Solid-state spectroscopy and crystallography
  • Carbon Nanotubes in Composites
  • Graphene research and applications
  • Boron and Carbon Nanomaterials Research
  • Chalcogenide Semiconductor Thin Films
  • Reservoir Engineering and Simulation Methods
  • Quantum Dots Synthesis And Properties
  • Organic and Molecular Conductors Research
  • Advanced Chemical Physics Studies
  • Induction Heating and Inverter Technology

National Institute of Advanced Industrial Science and Technology
2015-2024

Ibaraki University
2017

Photonics Electronics Technology Research Association
2013-2015

Toray Industries, Inc. (Japan)
2010

Toray (United States)
2008-2009

Tokai University
2006

University of Tsukuba
2001-2003

Japan Advanced Institute of Science and Technology
1994-2003

Panasonic (Japan)
1987-1992

Raman scattering experiments were carried out on Si∕SiGe heterostructures. The strain in both the top Si layer, and Si1−xGex buffer layers with various Ge compositions was evaluated using several excitation sources, together x-ray diffraction secondary ion mass spectrometry. strain-shift coefficient, which is a necessary quantity to evaluate by spectroscopy, precisely determined. dependence of Si–Si band frequency composition SiGe alloy also examined. We found that strained top-Si thickness...

10.1063/1.2178396 article EN Journal of Applied Physics 2006-03-01

Recent development of device fabrication SiC is awaiting detailed study the machining surfaces. We scratched 4H-SiC surfaces with a sliding microindenter made chip, and characterized affected layers by micro-Raman spectroscopy. The results Raman measurement scratching grooves revealed that there were residual stress, defects, stacking faults. Furthermore, heavy load, we found clusters amorphous SiC, Si, carbon, graphite in grooves. Analysis spectra showed amorphization occurs first surface...

10.1063/1.4939985 article EN cc-by AIP Advances 2016-01-01

Micro-Raman imaging measurements of $n$-type $4H\text{\ensuremath{-}}\mathrm{Si}\mathrm{C}$ crystals with graded donor concentration were carried out, and spatial distributions the free carrier concentration, mobility, longitudinal optical (LO) phonon damping obtained from a line shape analysis LO phonon-plasmon coupled (LOPC) mode. The carriers optic phonons was determined as function density. We an empirical relationship between relative Raman shift LOPC mode, which is in close agreement...

10.1103/physrevb.76.245208 article EN Physical Review B 2007-12-21

Multiple energy phosphorous ions were implanted into 4H-SiC at room temperature and an elevated (500 °C) followed by annealing various temperatures. Deep ultraviolet Raman microscopy was used to analyze the effect of implantation dose postannealing on recovery surface layers damaged implantation. The analysis showed that rate crystallinity increased with increase in temperature. However, for highly dosed samples, not complete even temperatures up 1700 °C. With room-temperature implantation,...

10.1063/1.1931039 article EN Journal of Applied Physics 2005-06-15

For n-type 4H-SiC crystals with carrier concentrations between 2 × 1017 and 2.5 1020 cm−3, Fano interference of the folded transverse acoustic (FTA) doublet modes was observed. The line-shape parameters were shown to vary concentration. It is proposed that peak shifts in FTA resulting from an electronic continuum state can be used measure concentration for up cm−3. In addition, relative intensity varies markedly above 5 1018 This suggests mode coupling occurs components. variation ratio...

10.1063/1.4748279 article EN Journal of Applied Physics 2012-08-15

The formation of parasitic SiC inclusions was completely suppressed during solution growth using an liner crucible that provided conditions saturated only with SiC. In contrast, formed in a graphite as carbon source. For crucible, the frequency increased Cr content solvent, which ascribed to increasing C solubility. dissolution behavior crucibles containing Si–Cr solvents investigated; we found thickness Si–SiC–C composite layer on wall decreased solvent and disappeared for higher than 40...

10.1021/acs.cgd.3c01517 article EN Crystal Growth & Design 2024-03-06

Nanoscale understanding of high-temperature crystal growth dynamics in solution has been a challenge to be tackled by many researchers engaged investigating processes for bulk single growth. Here we propose new approach situ observation at buried solid/liquid interface using conventional confocal laser scanning microscope. In the 4H-SiC with Si–Ni based alloy flux as model system, show ability quantitatively analyze step motions growing SiC on nanoscale high temperatures up 1700 °C vacuum....

10.1021/acs.cgd.7b00325 article EN Crystal Growth & Design 2017-04-14

We have investigated growth rate and surface morphology of 4H-SiC single crystal grown from Si-C solution with various supersaturation levels at temperature in the range 1840 to 2140 °C. The depends linearly on amount supersaturated carbon, irrespective temperature. This indicates that is limited by transfer solute element onto crystallization front. adequate condition for stable are discussed respect high morphology.

10.4028/www.scientific.net/msf.740-742.23 article EN Materials science forum 2013-01-25

We have investigated the solution growth under various Al-N co-doping conditions. Both p-type and n-type 4H-SiC were successfully grown conditions, while using effect of Al-addition to stabilize both surface polytype. The doping electrical properties systematically. Interaction between Al N in incorporation process property heavily co-doped conditions discussed.

10.4028/www.scientific.net/msf.821-823.9 article EN Materials science forum 2015-06-30

Propagation of threading screw dislocations (TSDs) during hybrid growth, combined with TSD conversion by solution growth and bulk physical vapor transport, has been investigated for 4° off 15° C-face seeds. The converted defects on basal planes (BP-defects) are able to be eliminated continuing guide them a seed, while BP-defects revert TSDs seed. difference in the propagation is discussed based elastic energy balance between unit thickness higher off-angle

10.35848/1882-0786/ac15c1 article EN Applied Physics Express 2021-07-19

Cross-sectional CL measurements have been performed on the cleaved surface of Al-ion implanted 4H-SiC. The strong L1 luminescence that originates from DI defect has observed even in deep region (~10 μm) where ions do not penetrate. In layer, results show high-density non-radiative defects remain after activation annealing. Generation is presumably attributed to diffusion point layer.

10.4028/www.scientific.net/msf.600-603.615 article EN Materials science forum 2008-09-26

We have investigated Raman spectra of p-type 4H-SiC crystals with hole concentration ranging from 3×10 16 to 1×10 21 cm -3 . For folded transverse acoustic (FTA) doublet modes, Fano interference profiles were analyzed, and the frequency shift due was obtained as a function concentration. demonstrated that FTA modes is quantitative measure for evaluating 4H-SiC. Spectral features optical (TO) longitudinal phonon-plasmon coupled (LOPC) also studied various carrier concentrations. The results...

10.4028/www.scientific.net/msf.778-780.475 article EN Materials science forum 2014-02-26

We have developed the bulk growth technique to reduce threading screw dislocations (TSDs) by combining solution and PVT methods. More than 80 % of TSDs in original seed crystals were successfully converted Frank defects on basal planes 4° off C-face with Si-5at.% Ti solvent. After as-grown surface conversion layer, reduced. The presence micrometer-size macrosteps initial stage is important continue propagate during growth.

10.4028/www.scientific.net/msf.963.71 article EN Materials science forum 2019-07-19

Abstract The Raman scattering spectra of CdGa 2 Se 4 under pressure were investigated at 300 K up to 20.9 GPa. TO as well LO modes observed. Two stages observed in the dependences bands. Such a behaviour was attributed ordedisorder phase transition cation sublattice. A first‐order 20.2 Using HarrisoKeating model lattice dynamics modified for crystals with tetragonal structure, bulk modulus B and mode‐Grüneisen parameters Γ i determined first time. It is shown that better agreement between...

10.1002/pssb.200301579 article EN physica status solidi (b) 2003-01-30

We have reported depth and in-plane profiling of strain, Ge composition, defects in strained-Si∕Si1−xGex∕Si heterostructures using micro-Raman imaging. Raman the direction was carried out with a resolution ∼15nm small-angle beveled sample ultraviolet (UV) excitation. Depth profiles composition bandwidth clearly show that defect density depends strongly on Ge-grading rate compositionally graded Si1−xGex layer. The strain variation at given each layer has been evaluated. variations are closely...

10.1063/1.2355431 article EN Journal of Applied Physics 2006-10-01

We have investigated polishing-induced surface damage in nitrogen-doped {0001} 4H-SiC crystals with silicon and carbon faces through deep ultraviolet Raman microspectroscopy. The structural electrical properties of the damaged layers were characterized as a function abrasive particle size, using pure phonon modes longitudinal-optical-phonon plasmon coupled mode monitor bands. degree decreased size. Although polishing finer particles enables long-range order lattice to almost fully recover,...

10.1149/1.2170546 article EN Journal of The Electrochemical Society 2006-01-01
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