V. Sizyuk

ORCID: 0000-0002-6406-2572
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About
Contact & Profiles
Research Areas
  • Magnetic confinement fusion research
  • Fusion materials and technologies
  • Atomic and Molecular Physics
  • Laser-Plasma Interactions and Diagnostics
  • Laser-induced spectroscopy and plasma
  • Plasma Diagnostics and Applications
  • Advancements in Photolithography Techniques
  • Laser Design and Applications
  • Nuclear reactor physics and engineering
  • Superconducting Materials and Applications
  • Nuclear Materials and Properties
  • Ionosphere and magnetosphere dynamics
  • Gas Dynamics and Kinetic Theory
  • Laser Material Processing Techniques
  • Computational Fluid Dynamics and Aerodynamics
  • Diamond and Carbon-based Materials Research
  • Photocathodes and Microchannel Plates
  • Laser-Matter Interactions and Applications
  • Particle accelerators and beam dynamics
  • Data Quality and Management
  • Analytical chemistry methods development
  • Advanced Numerical Methods in Computational Mathematics
  • Calibration and Measurement Techniques
  • Metal and Thin Film Mechanics
  • Advanced Data Storage Technologies

Purdue University West Lafayette
2013-2024

University of Illinois Urbana-Champaign
2015

Argonne National Laboratory
2003-2010

Office of Scientific and Technical Information
2003-2007

Energy Technology Centre
2003

Office of Science
2003

A.V. Luikov Heat and Mass Transfer Institute
2002

National Academy of Sciences of Belarus
1998-2002

We investigated the effect of excitation wavelength on density evolution laser-produced tin plasmas, both experimentally and numerically. For producing Sn targets were excited with either 10.6 μm CO2 laser or 1.06 Nd:yttrium aluminum garnet laser; are considered to be potential lasers for extreme ultraviolet lithography plasma light sources. The electron during isothermal expansion regime was estimated using an interferometric technique. Stark broadening isolated singly-ionized emission...

10.1063/1.3562143 article EN Journal of Applied Physics 2011-03-15

An efficient extreme ultraviolet (EUV) generation method has been developed with the use of a CO2 laser-produced plasma from grooved target. A ∼5% conversion efficiency laser to 13.5 nm photons was obtained grooves in tin target or by repeated pulse shots at same position. Modeling studies proved that groove controls hydrodynamic expansion leading confinement which prevents escaping EUV production zone.

10.1063/1.3364141 article EN Applied Physics Letters 2010-03-15

Laser-produced plasma (LPP) from a tin target is being considered as the light source for next generation of extreme ultraviolet (EUV) lithography. An integrated model was developed to simulate behavior and EUV radiation output in LPP devices. The includes heat conduction hydrodynamic processes two-temperature approximation, well detailed photon transport using Monte Carlo methods. Multiple laser beams incident on single have been simulated full three-dimensional geometry, total...

10.1063/1.2365717 article EN Journal of Applied Physics 2006-11-15

Laser-produced plasma (LPP) devices are being developed as a light source for the extreme ultraviolet (EUV) lithography applications. One concern of such is to increase conversion efficiency laser energy EUV light. A new idea based on initiation and confinement cumulative jet inside hollow beam simulated. The integrated computer model (HEIGHTS) was used simulate behavior radiation output in LPP devices. takes into account heat conduction magnetohydrodynamic processes two-temperature...

10.1017/s026303460707019x article EN Laser and Particle Beams 2007-02-28

Abstract The international thermonuclear experimental reactor (ITER) is a worldwide project currently being built in France for the demonstration of feasibility technologies future realization successful commercial fusion energy. ITER tokamak based design using strong magnetic fields to confine very hot plasma needed induce reaction. Tokamak devices are front leading designs. Building device energy production great challenge. A key obstacle such performance during abnormal events including...

10.1038/s41598-021-81510-2 article EN cc-by Scientific Reports 2021-01-22

Physical and computational models are developed, used benchmarked for studying the response of ITER tokamak plasma facing components to runaway electron impact following a disruption. The energy deposition, temperature evolution material melting thickness calculated wide range parameters, namely, kinetic energy, magnetic field, partition ratio (along across field direction) duration, wall composition. It is shown that will have significant effect on heat load with first beryllium armor...

10.1088/0029-5515/49/9/095003 article EN Nuclear Fusion 2009-08-13

ABSTRACT Laser-produced plasma (LPP) devices have been modeled as the light source for extreme ultraviolet (EUV) lithography. A key challenge LPP is achieving sufficient brightness to support throughput requirements of high-volume manufacturing. An integrated model (HEIGHTS) was applied simulate environment EUV sources and optimize their output. The includes evolution magnetohydrodynamic processes in a two-temperature approximation, well photon radiation transport determined by Monte Carlo...

10.1080/10407780500324996 article EN Numerical Heat Transfer Part A Applications 2006-01-04

Building a successful device for the magnetic fusion energy production is great challenge. ITER an international project of tokamak based design being developed demonstration feasibility thermonuclear technologies future realization commercial energy. A key obstacle to however, performance during abnormal events including plasma disruptions and edge-localized modes (ELMs). credible reactor must tolerate at least few these transient without serious consequences such as melting structure. This...

10.1038/s41598-022-08837-2 article EN cc-by Scientific Reports 2022-03-18

During normal operation of the high confinement mode in future ITER devices, edge-localized modes (ELMs) are a potential threat to divertor components lifetime and plasma contamination. To predict outcome direct ELM impact on plate, conversion energy into radiation shielding layer, then resulting deposition flux surrounding areas, comprehensive physical numerical models developed implemented HEIGHTS package. The deposition, material erosion, vapour temperature density evolution, subsequently...

10.1088/0029-5515/50/11/115004 article EN Nuclear Fusion 2010-09-13

Efficient laser systems are essential for the realization of high volume manufacturing in extreme ultraviolet lithography (EUVL). Solid-state Nd:YAG lasers usually have lower efficiency and source suppliers alternatively investigating use power CO<sub>2</sub> systems. However, laser-produced plasmas (LPP) specific characteristics features that should be taken into account when considering them as light EUVL. The analysis recent experimental theoretical work showed significant differences...

10.1117/12.848222 article EN Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE 2010-03-11

During normal and disruptive operations in tokamak devices the escaped core plasma particles are a potential threat to divertor nearby component lifetime as well contamination. Comprehensive enhanced physical numerical models developed implemented upgraded High Energy Interaction with General Heterogeneous Target Systems (HEIGHTS) package accurately predict impact of on plasma-facing components. An ab initio Monte Carlo-based kinetic model escaping is for integration magnetohydrodynamic...

10.1088/0029-5515/53/7/073023 article EN Nuclear Fusion 2013-06-11

A fundamental issue in tokamak operation related to power exhaust during plasma instabilities is the understanding of heat and particle transport from core into scrape-off layer plasma-facing materials. During abnormal disruptive tokamaks, radiation processes play a critical role divertor/edge-generated dynamics are very important determining overall lifetimes divertor nearby components. This equivalent or greater than effect direct impact escaped on plate. We have developed implemented...

10.1063/1.4905632 article EN Physics of Plasmas 2015-01-01

Discharge produced plasma (DPP) devices are being used as a light source for Extreme Ultraviolet (EUV) Lithography. A key challenge DPP is achieving sufficient brightness to support the throughput requirements of exposure tools high-volume manufacturing lithography. An integrated model developed simulate environment EUV and optimize output source. The describes hydrodynamic optical processes that occur in devices. It takes into account evolution magnetohydrodynamic well detailed photon...

10.1117/12.534269 article EN Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE 2004-05-20

Physical models are developed to investigate the following conditions relevant discharge-produced plasma (DPP) devices under development for extreme ultraviolet (EUV) lithography: gaseous jet propagation in chamber, removal of neutral particles with a jet, and deviation charged magnetic field. Several geometries mitigation systems considered removing debris during EUV lithographic process. The design system is proposed simulated computer models. behavior Xe, Li, Sn Ar He jets by using high...

10.1117/1.2804128 article EN Journal of Micro/Nanolithography MEMS and MOEMS 2007-10-01

A key obstacle to a successful magnetic fusion energy production in Tokamak reactors is performance during abnormal events. Abnormal events include plasma disruptions, edge-localized modes (ELMs), vertical displacement events, and runaway electrons. While tremendous efforts are being made find ways mitigate such credible reactor design must be able tolerate few of these transient We have recently enhanced our comprehensive HEIGHTS (High Energy Interaction with General Heterogeneous Target...

10.1063/1.5026597 article EN Physics of Plasmas 2018-06-01

We have developed comprehensive integrated models for detailed simulation of laser-produced plasma (LPP) and laser/target interaction, with potential recycling the escaping laser out-of-band radiation. Recycling, i.e., returning radiation to extreme ultraviolet (EUV) generation region using retroreflective mirrors, has increasing EUV conversion efficiency (CE) by up 60% according our simulations. This would result in significantly reduced power consumption and/or increased output. Based on...

10.1063/1.5004980 article EN Journal of Applied Physics 2018-01-05

Current devices for EUV lithography combine both laser and discharge physics to achieve sufficient brightness with minimum debris generation support the throughput requirements of High-Volume Manufacturing (HVM) exposure tools long lifetime. Source performance, Debris mitigation, reflector system are critical efficient collection component Integrated models developed simulate emission at high power transport in hybrid devices. The being include, example, new ideas parameters beams In...

10.1117/12.771218 article EN Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE 2008-03-13

Abstract Plasma/material interactions is a critical scientific issue for fusion power, with major potential limitations on plasma core and edge operating parameters. Gaining understanding predictive capability in this area will require simultaneously addressing complex diverse physics occurring over wide range of lengths (angstroms to meters) times (femtoseconds days). This requires further development validation detailed models computational strategies at each these scales. The overriding...

10.1002/ctpp.201410014 article EN Contributions to Plasma Physics 2014-06-01

Discharge produced plasma (DPP) devices have been proposed as a light source for EUV lithography. A key challenge DPP is achieving sufficient brightness to support the throughput requirements of exposure tools high-volume manufacturing To simulate environment and optimize output source, an integrated model being developed describe hydrodynamic optical processes that occur in devices. The includes both evolution magnetohydrodynamic well detailed photon radiation transport. total variation...

10.1117/12.484929 article EN Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE 2003-06-13
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