- Metal and Thin Film Mechanics
- Semiconductor materials and devices
- Surface Roughness and Optical Measurements
- Plasma Diagnostics and Applications
- Optical Coatings and Gratings
- Copper Interconnects and Reliability
- ZnO doping and properties
- Particle accelerators and beam dynamics
- Electronic and Structural Properties of Oxides
- Ion-surface interactions and analysis
- Thin-Film Transistor Technologies
- Advanced Sensor Technologies Research
- nanoparticles nucleation surface interactions
- Advanced Measurement and Metrology Techniques
- Advancements in Photolithography Techniques
- Diamond and Carbon-based Materials Research
- Advanced Materials Characterization Techniques
- Industrial Vision Systems and Defect Detection
- Advanced Chemical Physics Studies
- Catalytic Processes in Materials Science
- Advanced Fiber Optic Sensors
- Adhesion, Friction, and Surface Interactions
- Silicon Nanostructures and Photoluminescence
- Analytical Chemistry and Sensors
- Acoustic Wave Resonator Technologies
Fraunhofer Institute for Surface Engineering and Thin Films
2013-2024
Fraunhofer Society
2016
A-Si/SiO 2 nanolaminates are deposited by magnetron sputtering and show a decreasing absorption when the a-Si single-layer thickness is reduced from 2.4nm to 0.7nm. Moreover, an increase of Tauc band gap 0.18eV measured. Experimental gaps compared calculated effective gaps, utilizing numerical Schrödinger solver. Further, it demonstrated that refractive index can be controlled adjusting SiO thicknesses in nanolaminates. The optically characterized spectroscopic ellipsometry, transmittance,...
Abstract In this paper, a previously established 3D multi-scale simulation chain of plasma deposition process, based on combination direct Monte Carlo (gas phase) algorithm and kinetic (kMC) (film growth) code, is improved by the addition particle-in-cell collision in order to take into account clarify role charged particles. The code also extended with binary approximation handle This modelling strategy successfully applied growth TiO 2 thin films means reactive magnetron sputtering....
Simulation and modeling find more their way into thin film technology. Beside theoretical models for layer design, pre-production design analysis, real time process control, atomistic simulation techniques gain of importance. Here, especially classical procedures such as Direct Particle-in-Cell Monte Carlo (DSMC/PIC-MC), kinetic (kMC) Molecular Dynamics (MD) well quantum mechanical based on Density Functional Theory (DFT) have to be mentioned. These methods are applied in order investigate...
The uniformity of a PVD coating process is investigated and adjusted in this work. With the help digital twin derived from physical modelling plasma gas flow dynamics reactor, it possible to precisely predict define gradients on individual surface geometries. By using calculated masks, distribution can be actively influenced. In addition, predicted during verified in-situ characterization techniques hyperspectral camera. method, sample measured lens optics with line focus. This measuring...
Optical thickness monitoring is implemented in almost all coating machines for high precision optical interference filters. Standard broadband transmittance comes to the limit of resolution when e.g. nanolaminates are deposited. Ellipsometry more sensitive material dispersion and interfaces gives detailed information on layers at beginning stack. On other hand, measurements can be used designs with higher layer count standard materials. In this contribution we show integration a ellipsometer...
This publisher’s note reports corrections in Appl. Opt. 62 , B141 ( 2023 ) APOPAI 0003-6935 10.1364/AO.475076 .
This publisher’s note reports corrections in Appl. Opt. 63 , 1641 ( 2024 ) APOPAI 0003-6935 10.1364/AO.515083 .
A novel optimization procedure for optical precision sputter coaters with respect to the film homogeneity is demonstrated. For a coater concept based on dual cylindrical sputtering sources and rotating turn-table as sample-holder, inherent radial decay of thickness must be compensated by shaper elements. that purpose, simulation model particle flux within such set up validated against experimental data. Subsequently, design optimized according modeled metal profile. The resulting deviations...
In broadband dielectric coatings, the wavefront of reflected wave can change dramatically in a resonance-like manner as function wavelength.These errors be significant issue high precision instruments.In last years, effort has been undertaken to design and produce coatings reduce these resonances.However, today there is still limited capability characterize by measurement spectral dependence error with resolution accuracy.The goal this paper present analyze for setup measure from coated flat...
The monitoring of thickness evolution during the deposition optical interference coatings is widely performed by transmittance measurements and continuous comparison with theoretical models. fitted actual layer influenced quality signal. Effects from light path, substrate spectrometers result in deviations because these are often not part We show an implementation unmodeled effects fitting algorithms. outcome different configurations while coating same filter design compared. Additionally,...
During optical monitoring using broadband transmittance measurement, the accuracy depends on how both substrate and path are aligned. We present a correction procedure to improve of monitoring, even if has features such as absorption or there is misalignment path. The in this case can either be test glass product. algorithm proven by experimental coatings which were produced with without correction. Additionally, system was also used perform an situ quality check. allows detailed spectral...
A multiple scale model approach is presented in order to investigate Al<sub>2</sub>O<sub>3</sub> thin film growth the framework of an existing Ion Beam Sputtering (IBS) coating process. Therefore, several simulation techniques are combined via optimized interfaces for realizing concept a virtual coater. Characteristic process parameters IBS plant applied as input material transport chamber, energy and angular distribution at substrate, formation structural properties, optical well electronic...
A multiple scale model named virtual coater is applied to investigate in the layer properties of growing films dependence PVD process conditions. Results for density, roughness, stress, and index refraction are presented.
A multiple scale model approach is presented in order to investigate Al2O3 thin film growth the framework of an existing Ion Beam Sputtering (IBS) coating process. Therefore, several simulation techniques are combined via optimized interfaces for realizing concept a virtual coater. Characteristic process parameters IBS plant applied as input material transport chamber, energy and angular distribution at substrate, formation structural properties, optical well electronic layer properties. The...
Market drivers for the increasing demand optical interference coatings on planar substrates and lenses include data communication systems consumer electronics. Magnetron sputtering can deliver environmentally stable with high throughput. Low defect densities combined stability of process coating system enable complex layer designs very accurate reproducibility. Cylindrical targets are well known large area such as window glass, but rarely used stacks counts. With OPTA X, we introducing a...