Hans‐Henning Strehblow

ORCID: 0000-0002-8670-9744
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About
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Research Areas
  • Corrosion Behavior and Inhibition
  • Electron and X-Ray Spectroscopy Techniques
  • Hydrogen embrittlement and corrosion behaviors in metals
  • Electrochemical Analysis and Applications
  • Semiconductor materials and devices
  • Anodic Oxide Films and Nanostructures
  • Concrete Corrosion and Durability
  • Copper-based nanomaterials and applications
  • Physics and Engineering Research Articles
  • Surface and Thin Film Phenomena
  • Electronic and Structural Properties of Oxides
  • Electrodeposition and Electroless Coatings
  • Ion-surface interactions and analysis
  • Metal and Thin Film Mechanics
  • Chalcogenide Semiconductor Thin Films
  • ZnO doping and properties
  • Quantum Dots Synthesis And Properties
  • Non-Destructive Testing Techniques
  • Electrocatalysts for Energy Conversion
  • X-ray Spectroscopy and Fluorescence Analysis
  • Extraction and Separation Processes
  • Molecular Junctions and Nanostructures
  • Advanced Materials Characterization Techniques
  • Gas Sensing Nanomaterials and Sensors
  • Engineering and Materials Science Studies

Heinrich Heine University Düsseldorf
2006-2021

Centre National de la Recherche Scientifique
2001-2008

Chimie ParisTech
2001-2008

Sorbonne Université
2001-2008

National Taiwan University of Science and Technology
2000-2004

Universität Ulm
2000

Instituto Venezolano de Investigaciones Científicas
1992

Weizmann Institute of Science
1992

Freie Universität Berlin
1970-1984

Hokkaido University
1982-1984

Abstract X‐ray photoelectron spectroscopy (XPS) has been used to investigate the electrochemical and thermal oxidation of titanium nitride (TiN) coatings prepared by physical vapour deposition (PVD) at 200°C. Electrochemical TiN was carried out various potentials in phthalate buffer solution (pH 5.0). Evaluation XPS Ti 2p N 1s spectra showed presence nitride, oxynitride oxide species layer formed anodic oxidation. The TiO 2 proceeds through formation a mixed oxynitride/oxide layer, which...

10.1002/sia.740230713 article EN Surface and Interface Analysis 1995-07-01

In situ electrochemical scanning tunneling microscopy (STM) measurements of the anodic oxidation Cu(111) in 0.1 M NaOH are reported. Anodic is preceded, underpotential range, by adsorption an ordered layer assigned to OH species. This adlayer a precursor oxide growing at higher potential with copper surface reordering mimic structural arrangement (111) oriented Cu2O oxide. range Cu(I) oxidation, Cu2O(111) film formed faceted, and most likely hydroxylated, surface. The nucleation, growth,...

10.1021/jp004012i article EN The Journal of Physical Chemistry B 2001-04-12

ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTCorrosion, layer formation, and oxide reduction of passive iron in alkaline solution: a combined electrochemical surface analytical studyS. Haupt H. StrehblowCite this: Langmuir 1987, 3, 6, 873–885Publication Date (Print):November 1, 1987Publication History Published online1 May 2002Published inissue 1 November 1987https://pubs.acs.org/doi/10.1021/la00078a003https://doi.org/10.1021/la00078a003research-articleACS PublicationsRequest reuse...

10.1021/la00078a003 article EN Langmuir 1987-11-01

Abstract Pit nucleation and repassivation on iron nickel has been examined by potentiostatic transient measurements. Very short times for the of corrosion pits some ms to 100 prepassivated specimens have observed. Addition picrate electrolyte can stop pit well at all potentials completely, but cannot prevent already existing pits. The results are explained adsorption‐ film breaking theory give contradiction penetration mechanism. in an early stage development takes Δ T r = 1 according...

10.1002/maco.19760271106 article EN Materials and Corrosion 1976-11-01

Passive layers on nickel and their change by the action of fluoride have been studied surface analyses such as x‐ray photoelectron spectroscopy (XPS) low energy ion scattering (ISS). The thickness is deduced from height XPS signals , O1s, F1s attenuation covering layers. Argon sputtering gives information in‐depth structure passivating films in combination with higher depth resolution ISS. Their chemical composition electrode potential time exposure to . A multilayer found an inner oxide...

10.1149/1.2115678 article EN Journal of The Electrochemical Society 1984-04-01

Abstract Es werden Untersuchungen über die Bildung kleiner Korrosionslöcher von etwa 1 bis 50 μ Durchmesser an Eisen unter der Wirkung Chlorid‐ und Sulfationen im Phthalatpuffer ( p H = 5) durchgeführt. Eine erhöhte Lochkeimbildung wird mechanisch durch Potentialänderung elektrisch gestörten Passivschichten beobachtet. Die ein mechanisches Aufreißen Passivschicht porenfreien Salzdeckschichten (auch Chemisorptionsschichten) in den Löchern gedeutet. Ein Transport aggressiven Ionen Schicht kann...

10.1002/bbpc.19700741016 article DE Berichte der Bunsengesellschaft für physikalische Chemie 1970-10-01

The passive film formed by electrochemical oxidation on two different stainless steels differing in molybdenum (Mo) content physiological solution with and without the addition of complexing agent, i.e., citrate, was studied using X-ray photoelectron spectroscopy. alloys were polarized at potentials chamber attached to spectrometer. Thus, composition analyzed spectroscopy prior exposure air (quasi situ). consists predominant oxides, chromium iron oxides. Oxides alloying elements nickel Mo...

10.1002/1097-4636(200011)52:2<404::aid-jbm22>3.0.co;2-z article EN Journal of Biomedical Materials Research 2000-01-01

Abstract The passivation of nickel has been studied in 1 M NaOH and 0.5 H 2 SO 4 by XPS. An electrochemical specimen preparation transfer to an ultra‐high vacuum, without contact with oxygen, permits a detailed examination the oxide growth potential time resolution. Quantitative evaluation data yields values for thickness partial layers duplex film structure. Ni/NiO/Ni(OH) sequence passive range Ni/NiO/NiOOH transpassive alkaline solutions have confirmed peak analysis, including...

10.1002/sia.740140305 article EN Surface and Interface Analysis 1989-03-01
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