A5040355360- Advancements in Photolithography Techniques
- Fullerene Chemistry and Applications
- Integrated Circuits and Semiconductor Failure Analysis
- Electron and X-Ray Spectroscopy Techniques
- Nonlinear Optical Materials Research
- Boron and Carbon Nanomaterials Research
- Chemical Thermodynamics and Molecular Structure
- Energetic Materials and Combustion
- Advanced Chemical Physics Studies
- Graphene research and applications
- Advanced X-ray Imaging Techniques
- Carbon Nanotubes in Composites
- Advanced Physical and Chemical Molecular Interactions
- Polymer composites and self-healing
- Crystallography and molecular interactions
- Molecular Junctions and Nanostructures
- Nuclear Physics and Applications
- Copper Interconnects and Reliability
- Thermal and Kinetic Analysis
- Advanced Fiber Optic Sensors
- 3D IC and TSV technologies
- Advanced Surface Polishing Techniques
- Synthesis and properties of polymers
- Nanofabrication and Lithography Techniques
- Organophosphorus compounds synthesis
Virginia Tech
2024
Tennessee Technological University
2021-2023
University of Edinburgh
2013-2014
Sandia National Laboratories California
1993-2000
Texas A&M University
1997-1999
Sandia National Laboratories
1992-1995
University of Oxford
1986-1987
Duke University
1984
Procter & Gamble (United States)
1980
The reaction of C(60) with BH(3): tetrahydrofuran in toluene followed by hydrolysis yielded C(60)H(2). This product was separated high-performance liquid chromatography and characterized as the addition H(2) to a 6,6-ring fusion (1alb isomer). (1)H nuclear magnetic resonance (NMR) spectrum remained sharp singlet between -80 degrees +100 C, which suggests static structure on NMR time scale. Hydrolysis proposed borane acetic acid-d(1) or D(2)O C(60)HD, its (3)J(HD) coupling constant is...
Equilibration of 1,9- and 7,8-C 70 H 2 has allowed the relative free energy these isomers to be measured. These "simplest hydrocarbon derivatives C " are formed by hydroboration at room temperature. Analysis platinum-catalyzed equilibration yielded a 295 kelvin 1.4 ± 0.2 kilocalories per mole, with 1,9 isomer being more stable. This value is in excellent agreement ab initio HF/6-31 G * calculated difference 1.3 whereas semiempirical calculations gave poor agreement.
ADVERTISEMENT RETURN TO ISSUEPREVArticleStudy of Acid-Base and Redox Equilibria for the C60/C60H2 System in Dimethyl Sulfoxide SolventMurat E. Niyazymbetov, Dennis H. Evans, Susan A. Lerke, Paul Cahill, Craig C. HendersonCite this: J. Phys. Chem. 1994, 98, 49, 13093–13098Publication Date (Print):December 1, 1994Publication History Published online1 May 2002Published inissue 1 December 1994https://pubs.acs.org/doi/10.1021/j100100a045https://doi.org/10.1021/j100100a045research-articleACS...
The room-temperature mechanical properties of a closed-cell, polyurethane encapsulant foam were measured as function density. Over the range densities examined, modulus could be described by power-law relationship with respect to This was same for both tension and compression testing. basis this is explained in terms elastic compliance cellular structure using simple geometric model put forth Gibson Ashby. collapse stress, property relevant testing, also found exhibit density dependence work...
ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTElectrochemical properties of fullerene dihydrides C60H2 and C70H2Pierre Boulas, Francis D'Souza, Craig C. Henderson, Paul A. Cahill, M. Thomas Jones, Karl KadishCite this: J. Phys. Chem. 1993, 97, 51, 13435–13437Publication Date (Print):December 1, 1993Publication History Published online1 May 2002Published inissue 1 December 1993https://pubs.acs.org/doi/10.1021/j100153a003https://doi.org/10.1021/j100153a003research-articleACS PublicationsRequest...
Nineteen chemically amplified ultrathin resists were imaged using exposure to extreme-ultraviolet (EUV) (13.4 nm) and deep-ultraviolet (DUV) (248 radiation. Direct comparisons made of photospeed, resolution, line edge roughness (LER). The photospeed these at 248 nm shows a good correlation with EUV for three polymer types, but appears independent photoacid generator type. This result underscores the importance in generation EUV. Resolution showed poor between DUV Correlations EUV-imaged...
We have designed a hyper-Rayleigh scattering scheme to measure six scalar invariants of the squared hyperpolarizability tensor β2. Our theoretical approach expresses rotational irreducible β components as scalars, which eliminates need for difficult frame transformations. applied our several conjugated chiral molecules and found that there are significant Kleinman-disallowed pseudotensor contributions their hyperpolarizability. These components, along with large optical rotation results...
In two separate experiments, we have successfully demonstrated the transfer of dense- and loose-pitch line/space (L/S) photoresist features, patterned with extreme ultraviolet (EUV) lithography, into an underlying hard mask material. both a deep-UV (∼90 nm thick) was spin cast in bilayer format onto (50–90 subsequently exposed to EUV radiation using 10× reduction exposure system. The reticle fabricated at Motorola (Tempe, AZ) subtractive process Ta-based absorbers on Mo/Si multilayer blanks....
Fiber-optic sensors were installed on fatigue-critical components in the superstructure of a railroad bridge to monitor dynamic strains induced by trains crossing as well detect onset cracks. Each fiber Fabry-Perot interferometer (FFPI) strain gage was adhesively bonded stainless-steel strip facilitate all-weather installation steel members spot welding. FFPI also rail at an approach bridge. Electrical resistive gages colocated with fiber-optic for purpose performance verification. In...
Identisch sind das Hauptprodukt der kinetisch kontrollierten Reaktion von C 60 oder H 2 mit BH 3 und thermodynamisch stabilste 4 ‐Isomer 1 . Dies konnte durch ab‐initio‐Rechnungen vorausgesagt experimentell belegt werden. magnified image
The thickness of the photoresist directly impacts etch stand off and may impact number defects in spin- coated film. However, maximum imaging layer for extreme ultraviolet lithography (EUVL) is limited by absorption radiation. Attenuation materials at relevant EUV wavelengths was calculated with atomic extinction coefficients provided from Henke et al. calculations indicated that have an optical density (O.D.) 4.0 micrometer<SUP>-1</SUP> (base e) so 100 nm thick layers approximately 67%...
The capabilities of the EUV 10x microstepper have been substantially improved over past year. key enhancement was development a new projection optics system with reduced wavefront error, flare, and increased numerical aperture. These concomitant developments in reticles photoresists enabled dramatic improvements imaging, illustrated by resolution 70 nm dense lines spaces (L/S). CD linearity has demonstrated for L/S range 100 to 80 nm, both imaging layer subsequent pattern transfer. For +/-...
Extreme ultraviolet (EUV) lithography masks were fabricated using a stack of TaSi or TaSiN (absorber), SiON (repair buffer), and Cr (conductive etch stop) on Mo/Si multilayer mirror deposited Si wafer. High-resolution structures exposed commercial i-line resist, the pattern was transferred both electron cyclotron resonance reactive ion etching with halogen-based gases. Process temperatures to fabricate these reticles always maintained below 150 °C. EUV properties after patterning measured...
The strong attenuation of EUV radiation in organic materials has necessitated the use a thin layer imaging (TLI) resist for lithographic patterning. We have studied several TLI processes and found an ultra-thin single (UTR) over hardmask is plausible system. developed new system based on DUV chemical approaches. These pattern features as small 70 nm L/S isolated features. UTR process shows high sensitivity low line edge roughness compared to other resists such top-surface imaging. advantage...
The strong attenuation of extreme UV (EUV) radiation by organic materials necessities the use a thin layer imaging (TLI) process for EUV lithography. Several TLI processes have been identified potential EUVL, and common theme in these approaches is transfer aerial image to refractory-containing material, which then used as dry O<SUB>2</SUB> etch mask during subsequent pattern device layer. One that has extensively examined EUVL silylated top-surface (TSI) technology, discussed this paper....
Early in the morning of March 3, 2020, a storm system producing multiple tornadoes passed through middle Tennessee. One tornadoes—touching down Cookeville and Putnam County—was classified as an EF4 with winds approximately 282 km/h (175 mph). Damage observations after tornado suggest that modifications to certain common construction practices might significantly enhance resistance extreme wind forces. This paper provides recommendations for improving strength resiliency within residential...