- X-ray Diffraction in Crystallography
- Crystallization and Solubility Studies
- Advanced Surface Polishing Techniques
- Laser Material Processing Techniques
- Diamond and Carbon-based Materials Research
- Laser-induced spectroscopy and plasma
- Glass properties and applications
- Quantum Mechanics and Applications
- Quantum Information and Cryptography
- Photonic Crystals and Applications
- Metal and Thin Film Mechanics
- Advanced materials and composites
- Advanced machining processes and optimization
- High-pressure geophysics and materials
- Surface Roughness and Optical Measurements
- Diatoms and Algae Research
- Quantum Computing Algorithms and Architecture
- Electrophoretic Deposition in Materials Science
- Semiconductor materials and devices
- Quantum optics and atomic interactions
Dalian University of Technology
2007-2025
Dalian University
2008
Fused silica is extensively used across various industries due to its superior properties, but densification can significantly alter performance. Detecting these changes requires high spatial resolution, which challenges the limits of current testing methods. This study explores use scattering-type scanning near-field optical microscopy (s-SNOM) analyze in fused through a combination experimental techniques-atomic force microscopy-based infrared spectroscopy (AFM-IR) and s-SNOM-and...
During the thinning process of plate-shaped optical parts (PSOP), release internal stress would cause deformation ultra-thin PSOP, which deteriorates processed surface figure. The stress-release-induced is hard to be predicted and controlled due difficulty in measuring tiny PSOP. In this paper, an analytical model established depict variation during process. It can used calculate initial distribution along thickness according residual sample. Meanwhile, predict whole prediction results...
Although no optically visible damage is produced in the fused silica under laser irradiation below its laser-induced threshold (LIDT), defect proliferation may occur due to evolution of internal atomic structure. The escalation content leads heightened absorption, and resulting degradation optical performance optics. In recent decades, there have been a lot experimental studies on conditioning, but still great lack in-depth understanding theoretical analysis process point defects silica....
Surface hydroxylation is the basis for material removal in chemical mechanical polishing (CMP) of monocrystalline silicon, diamond, and YAG crystals. Existing studies use experimental observations to investigate surface hydroxylation, but lack in-depth understanding process. In this paper, first time best our knowledge, we analyze process crystals an aqueous solution using first-principle calculations. The presence was verified by X-ray photoelectron spectroscopy (XPS) thermogravimetric mass...