Dong Hwan Son

ORCID: 0009-0002-7461-9845
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About
Contact & Profiles
Research Areas
  • Organic Electronics and Photovoltaics
  • Conducting polymers and applications
  • Organic Light-Emitting Diodes Research
  • Advancements in Photolithography Techniques
  • Perovskite Materials and Applications
  • Image Processing Techniques and Applications
  • Thin-Film Transistor Technologies
  • Advanced Surface Polishing Techniques
  • Advanced optical system design
  • Silicon and Solar Cell Technologies
  • Optical Systems and Laser Technology
  • Nanofabrication and Lithography Techniques
  • Optical measurement and interference techniques
  • Advanced Measurement and Metrology Techniques

Pukyong National University
2024-2025

Luminex (United States)
2009-2010

To clarify the influence of electron-withdrawing chlorine (Cl) substituents, two benzothiadiazole (BT)-based D–A-type polymers, PBCl-BTT and PBCl-BTTCl, were utilized in non-fullerene polymer solar cells (PSCs). PBCl-BTTCl has an extra Cl atom on BT unit compared to PBCl-BTT. Because Cl, exhibits distinct properties, such as low energy levels, blue-shifted absorption, a larger bandgap. However, despite more chlorine, inverted-type device based displayed lower efficiency (4.32%) than (7.31%)....

10.1080/15421406.2024.2448313 article EN Molecular Crystals and Liquid Crystals 2025-01-11

ABSTRACT Inverse Lithography Technology (ILT) is becoming one of the strong candidates for 32nm and below. ILT masks provide significantly better litho performance need to be enabled production as leading low-k1 lithography. By very nature are computed, they could seem complicated manufacture in production. In a prior publication [1], it has been shown at clip level that Synthesizer (IS™) product capability adjust mask complexity make more manufacturable while maintaining significant gains...

10.1117/12.833572 article EN Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE 2009-09-30

Inverse Lithography Technology (ILT) is becoming one of the strong candidates for 32nm and below. ILT masks provide significantly better litho performance than traditional OPC masks. To enable production as leading low-k1 lithography, major task to overcome mask manufacturability including data fracturing, MRC constraints, writing time, inspection. In prior publications<sup>[4,5]</sup>, it has been shown that Synthesizer (IS<sup>TM</sup>) product capability adjust complexity make more...

10.1117/12.867995 article EN Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE 2010-04-29
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