Weiwei Dong

ORCID: 0009-0005-2269-7448
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About
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Research Areas
  • Electromagnetic wave absorption materials
  • Metallic Glasses and Amorphous Alloys
  • Dyeing and Modifying Textile Fibers
  • Carbon and Quantum Dots Applications
  • High-Temperature Coating Behaviors
  • Nanocluster Synthesis and Applications
  • Enzyme-mediated dye degradation
  • Photopolymerization techniques and applications
  • Advanced Nanomaterials in Catalysis
  • Power Systems and Renewable Energy
  • Advanced Cellulose Research Studies
  • Photochromic and Fluorescence Chemistry
  • Perovskite Materials and Applications
  • Power Systems and Technologies
  • Graphene research and applications
  • Supercapacitor Materials and Fabrication
  • Glass properties and applications
  • Advanced biosensing and bioanalysis techniques
  • Solid State Laser Technologies
  • Optical properties and cooling technologies in crystalline materials
  • Advanced Sensor and Energy Harvesting Materials
  • High Entropy Alloys Studies

Donghua University
2020-2025

Shanghai Institute of Technology
2024

Anhui Jianzhu University
2020-2022

Abstract The traditional dyeing process of reactive dyes requires a large amount inorganic salts to accelerate the combination and textiles, which leads substantially more water pollution. In this work, we used quaternary ammonium‐type cationic modifier, 3‐chloro‐2‐hydroxypropyl trimethylammonium chloride (CHPTAC), modify viscose acetal fibre before process. After modification, were dyed without any salt. Then fabric was finished with commercial wet rubbing fastness enhancer, FM‐8, improve...

10.1111/cote.12598 article EN Coloration Technology 2022-02-09

Considering the disadvantages of common methods for CsPbBr3 single crystal growth including high cost melt method and low shape controllability solution method, a facile hot-pressed (HP) approach has been introduced to prepare wafers. The effects HP temperature on phase purity HP-CsPbBr3 wafers performance corresponding photodetectors have investigated. preparing phase-pure, shape-regular, dense optimized be 150 °C, wafer based planar-type exhibit an ultrasensitive weak light photoresponse....

10.1021/acs.jpclett.2c00089 article EN The Journal of Physical Chemistry Letters 2022-03-29
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