A5029195315- Photonic and Optical Devices
- Advanced X-ray Imaging Techniques
- Photorefractive and Nonlinear Optics
- Photonic Crystals and Applications
- Structural Health Monitoring Techniques
- Acoustic Wave Resonator Technologies
- Advanced Fiber Laser Technologies
- X-ray Spectroscopy and Fluorescence Analysis
- Ion-surface interactions and analysis
- Optical and Acousto-Optic Technologies
- Sensor Technology and Measurement Systems
- Non-Destructive Testing Techniques
- Astrophysical Phenomena and Observations
- Ultrasonics and Acoustic Wave Propagation
- Crystallography and Radiation Phenomena
- Silicon Nanostructures and Photoluminescence
Changcheng Institute of Metrology & Measurement
2024
Changchun University of Science and Technology
2011
Argonne National Laboratory
2010
Multilayer Laue Lenses (MLLs) were developed by us using dynamic diffraction effects to efficiently focus hard x‐rays very small spots. Using a partial MLL we able 19.5‐keV line of 16 nm with an efficiency 31%. A full is complete linear structure. It can be fabricated bonding two wafers, or growing the structure magnetron sputtering without bonding. 40‐μm MLL, total 5166 layers WSi2 and Si, has been successfully grown sputter deposition. The layer thicknesses gradually vary from 4 ∼400 then...
The annealed proton-exchanged (APE) process has emerged as an important technique for the fabrication of low-loss optical waveguides in LiNbO3. propagation characteristics a silicon-clad X- and Z-cut APE channel waveguide are investigated by semi-vectorial beam method (BPM). Numerical results several different structures indicate that attenuation dielectric clad with silicon behaves damped periodic oscillation increasing thickness. Results also show propagating mode is highly dependent on...
The efficiency of acousto-optic interaction in single-mode strip silica waveguide is analyzed theoretically by determining the overlap integral between optical and acoustic field distributions. results show that there a good SAW fields low frequency range. At high frequencies, decreases with increasing frequency. 216 MHz, maximum 0.8544 for obtained, provided H/Λ equals 0.02. last, diffraction efficiencies MHz are calculated as function square root power different apertures.